Image display apparatus

ABSTRACT

An image display apparatus includes an indicating element which modulates or emits light as a pixel in accordance with image information. A displacement unit optically displaces a position of the pixel for each of two or more sub-fields constituting an image field corresponding to the image information. A projection unit enlarges the pixel and projects an enlarged pixel on a screen. A pixel-profile deformation unit changes an optical intensity profile of the pixel.

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The present invention relates to an image display apparatus ofhigh resolution imaging which is provided with a pixel displacement unitwhich carries out optical displacement of the pixels of the imagingelements, such as those in a spatial optical modulator or a spatiallight discharge unit, for each of two or more sub-fields of the imagefield. More specifically, the present invention relates to a projectionimage display apparatus of high resolution imaging which is applicableto a front or rear projector which projects a real image on the screen,and a head-mounted display or a view finder which projects a virtualimage on the screen.

[0003] 2. Description of the Related Art

[0004] Japanese Laid-Open Patent Application No. 04-113308. (JapanesePatent No. 293926), Japanese Laid-Open Patent Application No. 05-289044,Japanese Laid-Open Patent Application No. 09-152572, Japanese Laid-OpenPatent Application No. 06-324320, and Japanese Laid-Open PatentApplication No. 2000-98968 disclose a projection image display methodwhich is made to carry out the optical displacement of the image of thespatial optical modulator (for example, the liquid crystal unit)optically for every sub-field, and projects the image at a resolutionhigher than the resolution of the spatial optical modulator.

[0005] The conventional image display devices of the above documents canobtain the twice (or 4 times) as many pixel, i.e., twice (or 4 times) asmany resolution as the, as the respectively on the screen by carryingout displacement of the pixel optically by optical-axis shift to the twolocations (or location of four every direction) perpendicular to thescanning line, and making the sub-field corresponding to thedisplacement into the two sheets or the four sheets.

[0006] Moreover, Japanese Laid-Open Patent Application No. 08-194207,Japanese Laid-Open Patent Application No. 09-230329, and JapaneseLaid-Open Patent Application No. 09-015548 disclose an image displaymethod which controls the amount of the optical displacement of thearrangement of the pixels and the optical-axis shift and thedisplacement direction thereof. The conventional image display devicesof the above documents improve 3 times the resolution of the modulatorby making the displacement of the three locations carry out in the samedirection, and on the other hand, putting spatially, the RGB pixelswhich are produced by the spatial separation with the filters.

[0007] By performing the optical displacement, the delta arrangement ofRGB is realized, or only some pixels indicated only in the specificportion are displaced, and the image display device which performshigh-resolution imaging is also disclosed.

[0008] Japanese Laid-Open Patent Application No. 04-113308 discloses thespatial optical modulator in which the pixel size is smaller than thepixel pitch by one half. When the high-resolution imaging is performedby using the modulator and the optical-axis shift unit, the projectionimage-forming device of high resolution imaging which does not producethe lap between the adjoining pixels is also disclosed.

[0009] However, the pixel configuration is mainly determined in theaperture configuration of the spatial optical modulator, and since thepermeability in the aperture is uniform, the optical intensity crosssection which the contour configuration of the pixel in the fieldcontaining the pixel is usually the square, and is the beam profile(pixel profile) has the pixel profile which has the rectangleconfiguration which has the big step with the edge of the aperture.

[0010] For the reason, the gradation of edge of the image including oneor more continuous pixels in the spatial optical modulator turns, into alarge, spatial-frequency modulation, and the “resolution” measured bythe optical intensity distribution of the line and space in the maximumspatial frequency of the pixel unit, and the “sharpness” by viewingbecome good. However, as the evaluation by viewing, the “hardness”, the“jaggies”, and the “image discontinuity” of the image becomeconspicuous. The problem corresponds to the disadvantage of the image ofthe liquid crystal over the image of CRT.

[0011] The pixel profile of CRT is the pixel profile that is similar tothe Gaussian distribution form, and is a smooth image in which the“hardness”, the “jaggies”, and the “image discontinuity” are notconspicuous as the visibility. The “gradation discontinuity” stopssimultaneously, being conspicuous as the results.

[0012] However, the “resolution” and the “sharpness” are not so good forthe number of the pixels or on the basis of the number of the pixels.

[0013] On the other hand, the contour configuration of the pixel of theliquid crystal display which is the flat panel is the rectangle, and thepixel profile is the rectangle configuration.

[0014] For the reason, “resolution” and the “sharpness” are the imagesin which the “hardness”, the “jaggies”, and “image discontinuity” areconspicuous to being good on the basis of the number of the pixels, orthe number of the pixels.

[0015] For the reason, even if it is monochrome character-of binarydata, the processing which performs the high-gradation display whichused gray scale about the “edge” portion, and stops being conspicuous inthe “hardness”, the “jaggies”, and “image discontinuity” with thesoftware processing to the font image may be made.

[0016] In the case of the conventional data projector of low resolutionof SVGA or XGA class, the amounts of information of the one screenitself run short from the first for low resolution.

[0017] The number of the dots which forms the one character will be inthe few state, in the case, it may become the impression which fadedwhen the edge is not sharp, the distinction nature of the character mayget worse, the visibility may tend to deteriorate, and the “hardness” asthe visibility, the “jaggies”, “image discontinuity”, and “gradationdiscontinuity” may be conversely desirable.

[0018] However, in the low resolution about VGA, in the case of theprojector of the object for the images of the case of the projector forthe images, and the high resolution more than UXGA, and both for data,it sets.

[0019] It becomes important to consider the environment more by energysaving at the same time unlike the conventional projector for data oflow resolution the request to the image quality is becoming enough as anamount of information of the one screen, realizes “the smoothness of thefield and the edge” of the image by the high resolution on it, improvesthe visibility, improves the observer's recognition rate, reduces therate of the error and reduces fatigue of the observer.

[0020] For the reason, the multiplication effectiveness according usingthe optical-axis shift unit to the one the twice of the original liquidcrystal light valve, and further 3 times the number of the scanninglines of the, and the data linear density.

[0021] For example, consideration is given to performing the 4-foldhigh-resolution imaging or the 9-fold one for the number of the pixels.When the 4-fold high-resolution imaging is performed and pixel reductionis carried out to 50% or less of the conventional rates of the linearaperture (or the usual rate of the area-aperture is 25% of the 2'spower), the pixel configuration of the projection image of projectingthe reduced pixel with the projection lens is difficult to realize the“smoothness of the field and the edge” which is demanded in the case ofthe high resolution, unlike the case of the conventional projector oflow resolution.

[0022] It is the projection lens, when the conventional pixel of thespatial optical modulator whose optical intensity the contourconfiguration is the square configuration and is the rectangleconfiguration is projected and projector equipment is produced.

[0023] Although the beam profile of the rectangle configuration ischanged and it becomes the pixel on the screen according to the MTFfrequency characteristic of the projection lens at the same time thesquare pixel is expanded on the screen for the predeterminedmagnification, it is changed so that it may have curvature with theusually big edge of the ends of the rectangle configuration.

[0024] Although the resolution of the projection lens for dataprojections differs greatly also with the kind of the image information,and the product price strap, in order to usually harness the resolutionof the liquid crystal light valve in high cost effectively relatively,30% or more is required for MTF in the highest spatial frequency whichthe pitch of the pixel gives, and it is 50% or more preferably.

[0025] If the projection lens is MTF 100% in all spatial frequencies atthe time, since the image in the liquid crystal light valve and theexpansion image on the screen have the relation of 1:1 completely, thepixel profile is the rectangle configuration and the “hardness” as thevisibility, the “jaggies”, and “image discontinuity” are the veryconspicuous images like the LCD monitor as a usual flat display.

[0026] Actually, since MTF of the projection lens is not completely 100%in the entire spatial frequencies, corresponding to approaching thesine-wave-pixel profile simply, image quality can receive thedeformation, and the beam profile of the rectangle configuration of thepixel can reduce the “hardness”, the “jaggies”, the “imagediscontinuity”, etc.

[0027] However, even if it projects the reduced pixel of 50% or less ofthe conventional rates of the linear aperture with the projection lensof comparatively low MTF and forms the projection image, the rate of theaperture is small, and there is the space between the adjoining pixelswhen MTF of the projection lens is dropped to the state where the“hardness”, the “jaggies”, the “image discontinuity”, etc. are notconspicuous. The resolution of the image also deterioratessimultaneously, and the “sharpness” of the image is reduced.

[0028] When MTF of the projection lens becomes still smaller than 30%,the inclination becomes still larger, improvement in the image qualitywhen performing high-resolution imaging by carrying out the optical-axisshift in the case is almost lost, and it becomes impossible to displayonly the deteriorated image instead.

[0029] This is the case when the focus location of the projection lensis shifted and the focal location is removed. As the pixel profile whichhas performed pixel reduction simply by making the rate of the apertureinto 50% or less of rates of the linear aperture, the pixel profilewhich decreases the “hardness”, the “jaggies”, “image discontinuity”,etc. is unsuitable in the case of high-resolution imaging.

[0030] Japanese Laid-Open Patent Application No. 09-054554 disclosesthat, when carrying out the optical-axis shift and performinghigh-resolution imaging, the above-mentioned method of focusing with thefocusing lens smaller than the comparatively large aperture of thepenetrated type liquid crystal panel

[0031]FIG. 16, FIG. 17A, and FIG. 17B show an example of theconventional image display apparatus which combines the penetrated typemicro lens to the penetrated type liquid crystal panel as the means forchanging the pixel size, which is disclosed in Japanese Laid-Open PatentApplication No. 09-054554.

[0032]FIG. 16 shows the example of the micro lens which has thepenetrated type liquid crystal light-valve with the specific aperture,and the circular contour which reduces pixel size rather than the smallaperture which is restrained and produced by the active unit.

[0033]FIG. 17A and FIG. 17B show the state of the continuation pixelprofile which is formed when the optical-axis shift of the pixel profileof the rectangle configuration having the pixel reduced by thecomposition of FIG. 16 is carried out.

[0034] In FIG. 16, reference numeral 101 is the incident-light ray, 102is the focusing optical system, 102 a is the minute lens, 103 is theindicating element, 103 a is the opening of the pixel which is providedin the indicating element 103, 101 a is the picture element which isformed with the focused light ray, and 104 is the outgoing ray.

[0035] The incoming ray 101 which is incident to the opening 103 a ofthe pixel of the indicating element 103 is focused by the minute lens102 in the focusing optical system 102, and the focusing pixel 101 a isincident to the opening 103 a and passes through it.

[0036] The ray which comes out from the opening 103 a after thispenetration turns into the outgoing beam 104.

[0037]FIG. 17A shows the state of the continuation pixel profile formedwhen the optical-axis shift is performed without reducing the pixelsize.

[0038]FIG. 17B shows the state of the continuation pixel profile formedwhen the optical-axis shift is performed when reducing the conventionalpixel shown in FIG. 16.

[0039] Both the states of FIG. 17A and FIG. 17B are shown to explain theoperation of the projection expansion apparatus using the penetratedtype liquid crystal light valve and the optical-axis shift unit whenperforming the high-resolution imaging that is the 2-fold one in onedirection.

[0040] As shown in FIG. 17A, when not carrying out pixel reduction, thepixel is slightly reduced by the aperture with the less than 100% areaopening factor determined by the arrangement of the active unit (notshown) prepared in the pixel.

[0041] Even if the pixel profile in the case is the rectangleconfiguration limited by the aperture and uniform lightinghigh-resolution it by optical-axis shift using such a pixel profile.While the resolution is not improved in spite of the optical intensityof these overlapping portions having increased in step and having usedthe optical-axis shift when the pixel profiles of the shifted rectangleconfiguration overlapped, there is the problem that the “discontinuity”of the image will be conspicuous.

[0042] When pixel reduction is carried out, the width of face of thepixel profile of the rectangle configuration is made into 50% or less ofthe pixel pitch, and the lap between the adjoining pixel profiles islost, but the resolution is improved as shown in FIG. 17B.

[0043] However, similar to the case of Japanese Laid-Open PatentApplication No. 04-113308, the pixel profile shown in FIG. 17B is thepixel profile of the rectangle configuration in which the rate of thelinear aperture is 50% or less. The “sharpness” as the visibility andthe “resolution” are good, but the “hardness”, the “jaggies”, and the“image discontinuity” are conspicuous like the LCD monitor as a usualflat display.

[0044] Although the can be reduced by changing the MTF characteristicsof the projection lens, the “resolution” and the “sharpness” willdeteriorate conversely.

[0045] For the reason, as the image projector of high resolution whichrealizes high-resolution imaging, or a data projector of highresolution, the projection image which secures the “sharpness” which isdemanded, unlike the case of the conventional projector of lowresolution, taking advantage of the high resolution imaging by increaseof the number of the pixels in the case of the high resolution imaging,and the “smoothness of the field and the edge” cannot be realized byshifting the pixel profile using the optical-axis shift unit.

[0046] Such a problem cannot be-resolved if the pixel profile of theprojection image having the pixel size reduced is in the rectangleconfiguration even when the contour configuration of the pixel ischanged to the circular configuration with the focusing optical systemas shown in FIG. 16. It is difficult to achieve the purpose ofhigh-resolution by increase of the number of the pixels using theoptical-axis shift unit.

[0047] Furthermore, in the case of Japanese Laid-Open Patent ApplicationNo. 04-113308, the pixel size is reduced, but it is materialized only onthe assumption that the beam profile of the rectangle configuration forwhich pixel reduction of 50% or less of rates of the linear aperture isneeded in order for the pixel profile not to lap, and the descriptionabout the pixel profiles other than the rectangle configuration is notaccepted at all, but is produced by the pixel profile of the rectangleconfiguration.

[0048] On the other hand, in the case of Japanese Laid-Open PatentApplication No. 09-054554, it is indicated that the brightness level,i.e., the optical intensity, is improved and the contrast is improved,since the average luminance per 1-pixel area does not improve even ifpeak luminance improves, except that the rate of the effective apertureof the pixel by reducing the pixel improves, there cannot be noimprovement in optical use efficiency.

[0049] Generally, the luminance of the case is reduced by the same orloss by the added optic on the basis of the area of the original pixel.

[0050] Furthermore, the case of Japanese Laid-Open Patent ApplicationNo. 09-054554 is premised on the rectangle configuration as a pixelprofile of the reduced pixel, as shown in FIG. 17B.

[0051] For the reason, when improving and doubling the resolution in onedirection using the optical-axis shift unit, in order for the pixel bywhich the optical-axis shift is carried out not to lap like FIG. 17A, itis necessary that the pixel reduction is at least 50% or less of therate of the linear aperture.

[0052] For the reason, the F value of the reflection light ray isincreased almost two times the F value of the incident light determinedby the lighting optical system, and a very bright lens as the projectionlens is required.

[0053] On the contrary, if the projection lens of the optimal F value isused when not carrying out pixel reduction, the reflection of theprojection lens will arise and it will become 25-50% of very low opticaluse efficiency as compared with the case where pixel reduction is notcarried out.

[0054] Moreover, the case where the F value of the reflection lightbecomes brighter than 2 double part by many yields of the optical systemused for pixel reduction arises.

[0055] Under the influence, the F value (it is the 1/2 twice as manyprojection lens as the at the F value) of the brightness of 2 twice isused at the angle of the outgoing beam, but the optical use efficiencywill decrease. For the reason, when carrying out pixel reduction, theimprovement in optical use efficiency is a very important problem.However, there is no teaching in Japanese Laid-Open Patent ApplicationNo. 09-054554 as to how to solve the above-mentioned problem.

SUMMARY OF THE INVENTION

[0056] An object of the present invention is to provide an improvedimage display apparatus in which the above-described problems areeliminated.

[0057] Another object of the present invention is to provide an imagedisplay apparatus in which the optical-axis shift unit is used toincrease the number of pixels and aim at the high resolution imaging,which secures the resolution and the sharpness of the projection imageand realizes the smoothness of the field and edge by reducing thehardness, the jaggies and the image discontinuity as in the conventionalimage display apparatus.

[0058] Another object of the present invention is to provide an imagedisplay apparatus in which the optical-axis shift unit is used toincrease the number of pixels and aim at the high resolution imaging,which effectively increases the efficiency of use of the light.

[0059] The above-mentioned objects of the present invention are achievedby a projection image display apparatus comprising: an indicatingelement which modulates or emits light as a pixel in accordance withimage information; a displacement unit which optically displaces aposition of the pixel for each of two or more sub-fields constituting animage field corresponding to the image information; a projection unitwhich enlarges the pixel and projects an enlarged pixel on a screen; anda pixel-profile deformation unit which deforms an optical intensityprofile of the pixel.

[0060] The above-mentioned objects of the present invention are achievedby an image display apparatus comprising: a light source which emitslight; an irradiation optical element which converts the light from thelight source into an irradiation beam; a plurality of optical modulatorsarranged on a flat surface, the plurality of optical modulatorsoptically modulating the irradiation beam incident to the opticalmodulators, and each optical modulator reflecting the irradiation beamto output a reflected beam; a light-path modulation unit modulating alight path of the reflected beam from the plurality of opticalmodulators in space coordinates; and a reflection-type beam profiledeformation unit, provided in each of the plurality of opticalmodulators, which deforms a beam profile of the reflected beam outputfrom each optical modulator.

[0061] According to the present invention, the relative opticalintensity near the edge of the pixel can be decreased according to thepixel profile of the non-rectangle configuration, the influence of thelap between the contiguity pixels when carrying out the optical-axisshift is reduced, and it is possible to provide an image displayapparatus which realizes the “sharpness” of the image and the“smoothness of the field and the edge” simultaneously.

[0062] Moreover, the angle of the outgoing light ray can be reduced byincreasing the relative value to the pixel pitch for the full width athalf maximum of the pixel profile, and the reflection of the outgoinglight ray can be reduced with the projection lens. Therefore, it ispossible to realize the image display apparatus which effectivelyincreases the efficiency of use of the light.

[0063] In the image display apparatus of the present invention, securingthe “resolution” and the “sharpness” is possible, and reducing the“hardness”, the “jaggies”, and the “image discontinuity” is possible.Thus, the “smoothness of the field and the edge” is realized and,according to the present invention, the bright projection image displayapparatus which effectively increases the efficiency of use of thelight.

BRIEF DESCRIPTION OF THE DRAWINGS

[0064] Other objects, features and advantages of the present inventionwill be apparent from the following detailed description when read inconjunction with the accompanying drawings.

[0065]FIG. 1 is a diagram showing the projection image display apparatusaccording to one embodiment of the present invention.

[0066]FIG. 2 is a diagram showing an example of the pixel reduction unitin the projection image display apparatus of FIG. 1.

[0067]FIG. 3 is a diagram for explaining the characteristics of anexample of the projection pixel profile of the non-rectangleconfiguration.

[0068]FIG. 4 is a diagram showing a pixel-profile deformation unit ofone embodiment of the present invention.

[0069]FIG. 5A, FIG. 5B, and FIG. 5C are diagrams showing the evaluationresults of one embodiment of the present invention and some comparativeexamples.

[0070]FIG. 6A and FIG. 6B are diagrams for explaining the half-width andthe CTF according to the present invention.

[0071]FIG. 7 is a drawing for explaining the definition of the CTFaccording to the present invention.

[0072]FIG. 8A and FIG. 8B are diagrams for explaining the definition ofthe CTF at the time of using the pixel-profile deformation unit and theoptical-axis shift unit.

[0073]FIG. 9A and FIG. 9B are diagrams showing an example of theprojection image for explaining the item of the subjectivity evaluationto the image quality of a projection image.

[0074]FIG. 10 is a diagram for explaining the characteristics of anexample of the pixel profile according to one embodiment of the presentinvention.

[0075]FIG. 11 is a diagram showing the results of calculation of theprofile on the screen.

[0076]FIG. 12A, FIG. 12B, and FIG. 12C are diagrams showing examples ofthe projection image for explaining the item of the subjectivityevaluation to the image quality of the projection image.

[0077]FIG. 13 is a diagram showing an example of the pixel-profiledeformation unit of the embodiment 11 of the present invention.

[0078]FIG. 14 is a diagram showing an example of the pixel-profiledeformation unit according to one embodiment of the present invention.

[0079]FIG. 15 is a diagram showing an example of a spatial opticalmodulator according to one embodiment of the present invention.

[0080]FIG. 16 is a perspective view of an example of a conventionalprojection image display apparatus.

[0081]FIG. 17A and FIG. 17B are diagrams for explaining the operation ofthe projection image display apparatus of FIG. 16.

[0082]FIG. 18 is a cross-sectional view of a reflection-type light valveaccording to one embodiment of the image display apparatus of thepresent invention.

[0083]FIG. 19 is a diagram for explaining operation of thereflection-type light valve of FIG. 18.

[0084]FIG. 20 is a diagram for explaining a relation between the maximumangle at the time of incidence to the pixel and the maximum angle at thetime of reflection.

[0085]FIG. 21 is a diagram for explaining the operation which changesthe pixel profile output by the reflection-type light valve, andincreases the number of the pixels.

[0086]FIG. 22A through FIG. 22G are diagrams for explaining theoperation which projects on the screen the reduced pixel which isreflected from the reflective concave mirror by the reflection-typelight valve.

[0087]FIG. 23 is a diagram for explaining an example of a high precisionprojector according to one embodiment of the present invention.

[0088]FIG. 24A and FIG. 24B are diagrams for explaining the definitionof the CTF according to the present invention.

[0089]FIG. 25 is a diagram showing the evaluation value of the pixelreduction at the time of changing the index of refraction of theembedding layer.

[0090]FIG. 26 is a diagram showing the rate of reduction which is theevaluation value of the pixel reduction when changing the curvature of aconcave mirror.

[0091]FIG. 27 is a diagram showing the CTF which is the evaluation valueof the pixel reduction when changing the curvature of a concave mirror.

[0092]FIG. 28 is a diagram showing one embodiment of the presentinvention when the micro lens and the mirror plane are united.

[0093]FIG. 29 is a diagram showing another embodiment of the presentinvention when the micro lens and the mirror plane are united.

[0094]FIG. 30 is a diagram showing another embodiment of the presentinvention when the micro prism and the mirror plane are united.

[0095]FIG. 31 is a diagram showing another embodiment of the presentinvention when the modulation layer and the concave mirror are united.

[0096]FIG. 32 is a diagram showing one embodiment of the presentinvention when using the shading layer for the spatial opticalmodulator.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

[0097] A description will now be provided of the preferred embodimentsof the present invention with reference to the accompanying drawings.

[0098]FIG. 1 and FIG. 2 show a projection image display apparatusaccording to the embodiment 1 of the present invention.

[0099] Specifically, FIG. 1 shows the projection image display apparatusof the embodiment and FIG. 2 shows an example of the pixel reductionunit.

[0100] In FIG. 1, reference numeral 1 is a white light source includinga high-pressure mercury lamp with the reflector, 2 is an opticalintegrator,,such as the fly eye lens, 3 is a color separation unit, suchas a color wheel, 4 is a spatial optical modulator, 5 is a polarizationbeam splitter (PBS), 6 is a macro lens, 7 is a pixel-profile deformationunit including a first micro-lens array 7 a and a second micro-lensarray 7 b, 8 is a projection lens, and 9 is a screen.

[0101] Although not illustrated in FIG. 1, an optical-axis shift unit isprovided in the projection lens 8 at the side of the pixel-profiledeformation unit, the optical-axis shift unit using the liquid crystalcell having the perpendicular orientation of the ferrodielectric liquidcrystal.

[0102] In FIG. 1, as for the intensity of the light coming out of thewhite light source 1 is equalized by the optical integrator 2, such asthe fly eye lens. The optical integrator 2 may be constituted by two flyeye lenses and a condenser lens. Alternatively, the polarization beamsplitter (PBS) array for polarization conversion may be provided.

[0103] The color separation unit 3, such as the color wheel, separatesthe incident light into three colors of red, green, and blue.

[0104] When the color wheel is used, it does not separate the incidentlight into red, green, and blue simultaneously, but it separates theincident light into red, green, and blue sequentially.

[0105] The light goes into the polarization beam splitter 5, and it isreflected by the pixel of the spatial optical modulator 4, and the lightseparated for every color passes the polarization beam splitter 5, andgoes into the micro lens 6.

[0106] In the micro lens 6, a middle image of the pixel is formed on thesurface of the first micro-lens array 7 a. The first micro-lens array 7a acts as the field lens. The image profile of the middle image isdeformed by the second micro-lens array 7 b, and it is projected on thescreen 9 by the projection lens 8. The projection image is formed by thepixel profile by which the high precision image is deformed into thescreen 9.

[0107] In the embodiment, in the projection lens 8, the thickness of theliquid crystal layer is about 100 micrometers. Two sets of optical-axisshift units are used for the liquid crystal cell having theperpendicular orientation of the ferrodielectric liquid crystal of theoptical-axis shift unit (not shown). The half-wave plate is provided inthe middle of the 2 sets of the optical-axis shift units, and itconsidered as the optical-axis shift means in which the optical-axisshift of 4 displacements of the horizontal direction 2 steps and theperpendicular direction 2 steps is possible.

[0108] Since the electrode needed to apply the electric field to thesubstrate transverse direction, the dielectric thick-film layer and thestrip-like electrode thereon are formed. Then, high voltage of 1 to 4 kVis applied to the ends of the electrode. By the configuration, theoptical-axis shift amounting to 5-10 micrometers in one direction ispossible.

[0109] In order to realize the high-speed response as the spatialoptical modulator 4 which is the indicating element, shifting theoptical axis for every sub-field is performed so that the image can bedisplayed, and the LCOS (liquid crystal on silicon) of ferrodielectricliquid crystal is used.

[0110] The pixel pitch of the spatial optical modulator 4 is 13.2micrometers. The micro lens 6 adjusts the imaging location relation sothat the pixel pitch of 13.2 micrometers is suited for the micro-lenspitch of 14.0 micrometers of the micro lenses 7 a and 7 b of thepixel-profile deformation unit 7.

[0111] The imaging location relation is adjusted so that the pitch ofLCOS and the pitch of 14.0 micrometers of the micro lenses 7 a and 7 bof the pixel-profile deformation unit 7 may be in agreement.

[0112] As the spatial optical modulator 4, the penetrated type liquidcrystal LV or the DMD (from Digital Instrument Co.) which useselevated-temperature polycrystal silicone in addition to the LCOS canalso be used. However, when using the DMD, the polarization beamsplitter 5 becomes unnecessary.

[0113] Moreover, the F value of the projection lens 8 is set to 2.4, andthe F value of the micro lens 6 is set to 4.0.

[0114] The pixel-profile deformation unit 7 as the pixel-profiledeformation unit in FIG. 1 is shown in FIG. 2. As shown in FIG. 2, thepixel-profile deformation unit 7 is formed by two sheets of the firstmicro-lens array 7 a and the second micro-lens array 7 b. As the focaldistance of the first micro-lens array 7 a could be large, in order thatthe power of the micro lens is made small, the pixel-profile deformationunit 7 is formed by the lamination type micro lens by the resinembedding. It is desirable that the focal distance of the secondmicro-lens 7 b is small, and the second micro-lens array 7 b is taken asthe air interface micro lens.

[0115] The adjustment of the first micro-lens array 7 a and the secondmicro-lens array 7 b is performed by using the 6-axis stage (thedirection of the optical axis: z, the two directions perpendicular tothe optical axis: x, y, and the three rotation directions about the x,y, z-axis) for each of the micro-lens arrays 7 a and 7 b.

[0116] The lamination type first micro-lens array 7 a shown in FIG. 2includes the micro-lens array 7 c, the adhesive 7 d, and the transparentcovering member 7 e. The material of the micro-lens array 7 c and thecovering member 7 e used is glass.

[0117] More specifically, the pixel reduction unit by the micro lens ofFIG. 2 in the convex configuration micro lens is produced by dry etchingof a neoseram substrate (or a crystallization transparent glass ofNippon Electric Glass Co.) according to the resist transferring method.It is combined with another neoseram substrate by using the UVphotoresist adhesive (Kyoritu Kagaku Co., #7702) of a low index ofrefraction. The adhesion hardening is carried out by the UV irradiation.The lamination type first micro-lens array 7 a is produced in themanner.

[0118] The material is not limited to the above example, and anymaterial may be used if the index of refraction, the etchingcharacteristics, and the thermal expansion coefficient are appropriatelyselected.

[0119] The expansion imaging of the projection pixel in the sub-fieldobserved on the screen 9 of the projection image equipment shown in FIG.1 is carried out with the projection lens 8 in the pixel which has thepixel profile by which the pixel-profile deformation unit 7 shown inFIG. 2 is changed.

[0120] In the embodiment, by controlling appropriately the relativepositions of the first micro-lens array 7 a, the LCOS (the spatialoptical modulator 4) and the micro lens 6, the focal distance thereof,and the relative position and the focal distance of the secondmicro-lens array 7 b to the first micro-lens array 7 a, the relativeoptical intensity near the edge of the pixel can be decreased bydeforming the pixel profile into a non-rectangular configuration that isdifferent from the conventional rectangle configuration.

[0121] Accordingly, it is possible to provide a projection image displayapparatus in which the influence of the lap between the contiguitypixels when carrying out the optical-axis shift is reduced, and the“sharpness” of the image and the “smoothness of the field and the edge”are simultaneously realized.

[0122] Since the angle of the reflection light ray can be reduced bymaking the half-width of the pixel profile to the pixel pitch largerthan the case of the profile of the conventional rectangleconfiguration, the reflection of the outgoing light ray by theprojection lens 8 is reduced, and the projection image display apparatuswhich effectively increase the efficiency of use of the light can berealized.

[0123] The reduction of the outgoing beam angle is equivalent to theefficiency of the lighting area when considering as the pixel unitcorresponding to the portion which weakens the grade of the efficiencypixel reduction having become large, and is based on the increase of thelighting include angle which is made into the pixel unit for the reasonhaving been controlled.

[0124] By the ability decreasing the relative optical intensity near theedge of the pixel, the influence of the lap between the contiguitypixels when carrying out the optical-axis shift can be reduced, and the“sharpness” of the image and the “smoothness of the field and the edge”can be realized simultaneously. A detailed description of the matterwill be given in the following.

[0125] If the projection lens of a high MTF is used when forming theprojection image which projected the pixel which has the pixel profileof the rectangle configuration like LCOS with the projection lens.

[0126] Although the high resolution can be realized and the good“sharpness” can be realized by the projection pixel which has theprojection pixel profile of the abbreviation rectangle configurationcorresponding to the original pixel, they are the “hardness”, the“jaggies”, and the image in which “image discontinuity” is conspicuousand the “smoothness of the field and the edge” has deteriorated.

[0127] On the contrary, the projection lens of low MTF may be used, orthe focus point of the projection lens of high MTF may be removed.

[0128] Although the “hardness”, the “jaggies”, and “the smoothness ofthe field and the edge” that reduced “image discontinuity” can realizethe good image by the projection pixel which has the projection pixelprofile as having given curvature to the edge portion and flat portionof the rectangle configuration without making it correspond to the pixelprofile of the original pixel, only the projection image which“resolution” deteriorated as the and a trade-off and the “sharpness”reduced is unrealizable.

[0129] Since the optical intensity of the outgoing beam of the edgeportion of the pixel of the is the same as that of a part for the centersection of the pixel, it is for spreading widely to the range of thecontiguity pixel corresponding to the point image function which hasspread comparatively greatly corresponding to the projection lens of lowMTF.

[0130] The spread of the outgoing beam to the contiguity pixel in thecase is not necessarily limited to one pixel of the nearest neighbors,and spreads the nearest-neighbors pixel in one pixel, the 2nd pixel setthe 2 pixels, or the 3rd pixel or more.

[0131] According to this embodiment, by providing the optical element 7,the pixel profile of the rectangle configuration of the LCOS (spatialoptical modulator 4) is deformed per pixel. Since the pixel profile ischanged into a non-rectanglar configuration, the pixel which has theresulting pixel profile is projected with the suitable projection lens 8of MTF so that the projection image is formed on the screen.

[0132] The influence of the outgoing beam of the edge portion of thepixel which has the same optical intensity as a part for the centersection of the pixel can be reduced in this embodiment.

[0133] Accordingly, the relative optical intensity near the edge of thepixel can be decreased according to the pixel profile of thenon-rectangle configuration, the influence of the lap between thecontiguity pixels when carrying out the optical-axis shift is reduced,and it is possible to provide an image display apparatus which realizesthe “sharpness” of the image and the “smoothness of the field and theedge” simultaneously.

[0134] Moreover, the angle of the outgoing light ray can be reduced byincreasing the relative value to the pixel pitch for the full width athalf maximum of the pixel profile, and the reflection of the outgoinglight ray can be reduced with the projection lens. Therefore, it ispossible to realize the image display apparatus which effectivelyincreases the efficiency of use of the light.

[0135] The influence of the outgoing beam near the edge of the pixelwhich spreads to the pixel which adjoined based on the point spreadfunction of the projection lens 8 can be reduced by the deformation ofthe pixel profile by the optical element 7 (the pixel-profiledeformation unit), which more specifically prepared the relative opticalintensity near the edge of the pixel.

[0136] Furthermore, the deformation of the pixel profile by thepixel-profile deformation unit 7 for every pixel of the image differsfrom the pixel profile of the rectangle configuration receiving thedeformation with the projection lens 8.

[0137] This depends on the ability to decrease greatly spreading thenearest-neighbors pixel in one pixel, the 2nd pixel set the 2 pixels, orthe 3rd pixel or more, since the optical action is carried out for thedeformation of the pixel profile per pixel by the optical element of thepixel unit although the pixel which carried out the nearest neighbors isaffected some and the optical action is the pixel unit therefore.

[0138] For the reason, cross talk with the contiguity pixel can bereduced greatly.

[0139] Moreover, since the influence of the outgoing beam of the edge ofthe pixel is reduced to the pixel when the rate of the straight-lineaperture is larger than 50% and the relative value of the half-width ofthe pixel profile to pixel pitch is 70% or less, high “resolution” andthe good “sharpness” are realizable.

[0140] This can mean that it is seldom necessary to reduce the pixel,and only the part which is equivalent to at the rate and has reduced thespread of the outgoing beam can raise optical use efficiency.

[0141] The relative value of the half-width of the pixel profile to thepixel pitch in the case is 70% or less preferably, and is 60% or lessmore preferably.

[0142] Moreover, in the projection image display apparatus whichprepared and high resolution the optical-axis shift unit which shows thepixel which deformed the pixel profile into the non-rectangleconfiguration (configuration which is not the rectangle configuration)to FIG. 1 by the pixel-profile deformation unit 7 shown in FIG. 2, whenit projects on the screen 9 with the projection lens 8, the pixelprofile of the projection pixel is also projected in the non-rectangleconfiguration.

[0143] When the relative value of the half-width of the projection pixelprofile as opposed to projection pixel pitch to the projection pixelwhich has the pixel profile of the non-rectangle configuration is 70% orless at the time, the reduction of the “hardness”, the “jaggies”, andthe projection image in which “the smoothness of the field and the edge”which reduced “image discontinuity” has the good image of realization ofthe good image and the “sharpness” with high “resolution” is completedlike the case of the pixel before the original projection.

[0144]FIG. 3 shows an example of the projection pixel profile of theprojection pixel of the image of the non-rectangle configurationdisplayed in the projection image display apparatus shown in FIG. 1 andFIG. 2.

[0145] In FIG. 3, the horizontal axis is made into the relative positionon the screen, the axis of ordinate is made into relative opticalintensity, it is equivalent to the-die length whose nine points thehorizontal axis is mm unit and are one pixel, and the axis of ordinateis the arbitrary unit.

[0146] As shown in FIG. 3, unlike the conventional projection pixel, the“hardness”, the “jaggies”, and the “image discontinuity” of theprojection image can be reduced, and good “smoothness of the field andthe edge” and good “sharpness” can be achieved with high “resolution”according to the present embodiment.

[0147] The pixel profile of the projection pixel which is deformed bythe pixel-profile deformation unit 7 is measured by the method ofprojecting on CCD provided on the screen 9 by using the projection lens8.

[0148] Moreover, it is deformed by the pixel-profile deformation unit 7,and the pixel profile itself is measured simultaneously.

[0149] On the occasion of the measurement, the microscope has beenarranged instead of the projection lens 8, and it measured by the methodof carrying out incidence to CCD prepared in the imaging side of themicroscope.

[0150] At the time, the pixel profile measured under the microscopeevaluated NA of the projection lens 8, and NA of the microscope objectlens by the same appearance elevation by making it in agreementoptically.

[0151] Moreover, the MTF of the projection lens 8 changes with imagequantities, and the evaluation on the optical axis is mainly performed.

[0152] Actually, it is desirable to combine the MTF of the projectionlens 8 with the required pixel profile deformation, and design andevaluate the influences of image quantity optimally.

[0153]FIG. 4 shows the composition of the embodiment 2 which united thepixel-profile deformation unit 10 of the present invention with LCOS.

[0154] In FIG. 4, reference numeral 11 is the silicon substrate, 12 isthe liquid crystal layer, 13 is the middle substrate, 14 is the adhesivelayer, 15 is the micro-lens substrate, 16 is the convex configurationformed on the micro lens substrate, and 17, 18 and 19 are the opticalintensity distributions of the light ray which is equivalent to thepixel profile at the locations A, B and A′ as indicated in FIG. 4.

[0155] In FIG. 4, it is the back plain of LCOS, and the active unit andreflector by CMOS are formed in the silicon substrate 11 for everypixel, and the reflection-type spatial optical modulation in the pixelunit can be performed to it using the polarization lighting light andpolarization separation means by the liquid crystal layer 12 byimpressing the electric field to the liquid crystal layer 12 included bythe middle substrate 13 which has prepared ITO (not shown).

[0156] Moreover, by sticking the convex configuration 16 formed in themicro-lens substrate 15 with the middle substrate 13 using the adhesiveslayer 14, the lamination type micro lens is formed for every pixel, andthe micro lens and the reflector formed on the silicon substrate 11constitute the pixel-profile deformation unit 10.

[0157] In the location A which is the location which carried outincidence to the pixel-profile deformation unit 10, since the incomingray which are the polarization lighting light shown by the dotted linewhich carried out incidence from the left-hand side of FIG. 4 arebeforehand made uniform lighting, they have the pixel profile of therectangle configuration.

[0158] Then, in the location B which is the location which passed thepixel-profile deformation unit 10 and carried out incidence to themirror plane of the silicon substrate 11, it becomes the pixel-profileconfiguration where the pixel profile of the original rectangleconfiguration is deformed into some, and is rounded.

[0159] In the location A′ which is the location which it is reflected bythe mirror plane of the silicon substrate 11, and carried out incidenceto the pixel-profile deformation unit 10 again, relative opticalintensity of the surrounding edge of the pixel can be made small, andthe full width at half maximum (or the half-width) at that time deformsinto the pixel profile which becomes smaller than the half life width ofthe original drawing pixel.

[0160] The pixel profile changes with the locations of the direction ofthe optical axis in accordance with the light ray corresponding to thepixel which has passed through the pixel-profile deformation unit 10 andis converted to the reflection light ray as the outgoing light ray.

[0161] The projection pixel on which the pixel which has the pixelprofile which is not the rectangle configuration is made to project canbe obtained by arranging in the imaging-related location where LCOS andthe screen 9 of FIG. 4 which exchanged LCOS united with thepixel-profile deformation unit 10 for LCOS of the embodiment 1 shown inFIG. 1, abbreviated the pixel-profile deformation unit 7 to the microlens 6, and exchanged the projection lens 8 serve as the conjugate.

[0162] Accordingly, it is possible to provide an image display apparatuswhich realizes the “sharpness” of the image and the “smoothness of thefield and the edge” simultaneously with the reduction of the “hardness”,the “jaggies”, and the “image discontinuity”, similar to the embodiment1 of FIG. 1.

[0163] Moreover, the angle of the outgoing light ray can be reduced byincreasing the relative value to the pixel pitch for the full width athalf maximum of the pixel profile, and the reflection of the outgoinglight ray can be reduced with the projection lens. Therefore, it ispossible to realize the image display apparatus which effectivelyincreases the efficiency of use of the light.

[0164]FIG. 5A shows an example of the result calculated using theoptical-design evaluation tool about the projection image including theprojection pixel on the screen 9 when using the pixel-profiledeformation unit 7 in the composition of the embodiment 1 which showedthe pixel-profile deformation unit of the present invention to FIG. 1united with LCOS used as the embodiment 3 of the present invention.

[0165] The projection image which displayed the “kanji” character isshown, the lattice-like pattern of about 30 is made to the checklengthwise, the pitch corresponding to the one lattice is equivalent tothe pixel pitch of the original LCOS, and FIG. 5A is by thepixel-profile deformation unit 7.

[0166] It is projected with the projection lens 8 and the imaging of theprojection pixel is carried out to the screen 9 at the same time theoptical-axis shift unit carries out displacement of the optical locationby the time sharing, after this pixel profile is deformed.

[0167] In this embodiment, the field is compounded by the foursub-fields and the optical-axis shift unit is the optical-axis shiftunit which performs the 4-fold high resolution imaging as much increaseas the number of the pixels of 2×2.

[0168] As in the projection image on the screen 9 of FIG. 5A, theexperimental model is manufactured in the composition as shown in FIG.1, and while performing evaluation by the microscope and CCD which havebeen arranged instead of, calculation estimated the projection imageincluding the projection pixel on the screen 9 using the optical-designevaluation tool.

[0169] The number of the light rays is made into about 200,000-500,000using the light-tools (the 3.2th edition) of the U.S. Optical ResearchAssociate Co. in which the non sequential ray-tracing analysis based onMonte Carlo method may be used as an optical-design evaluation tool(when a 1-GHz CPU is used it is the computational complexity for about50-100 minutes).

[0170] In order to reduce the burden of calculation, the ray tracing isperformed only about two or more pixels of the specific range, andcalculated and evaluated the optical intensity distribution in the largerange in the screen side by carrying out the convolution of theevaluation result obtained by the calculation evaluation tool of theseparate its original work in the light-tools.

[0171] Moreover, although it has normalized so that the highest lightintensity value may turn into the constant value, for the reason, theaverage is not necessarily fixed.

[0172] On the occasion of the modeling, the surface-integral cloth ofthe discharge light of the high-pressure mercury lamp and theinclude-angle distribution are also taken into consideration, and thehigh-pressure mercury lamp aimed at adjustment with the experimentalvalue further based on the value of 150W class DC discharge lamp ofUshio Co. (the arc length: 1.1-1.2 mm).

[0173] The projection lens used for and designed separately the cord 5(the 8.6th edition) in which the sequential ray-tracing analysis of U.S.Optical Research Association Co. is possible besides the projection lensactually made as an experiment, and performed various evaluations.

[0174] Furthermore, the projection image by the experimental model isreceived in the image evaluation to the image on which it is projected.

[0175] The LCD and CRT which can display UXGA are used for theprojection image evaluated using the optical-design evaluation tool atthe same time it carries out directly. The 10×10 pixels to the 20×20pixels are set to new one pixel.

[0176] The subjectivity evaluation is performed in the statecorresponding to the resolution of 76-200 ppi to two or more observers,securing gradation nature and saving the pixel profile manufacturing asan image with the specific pixel profile, and changing the observationlocation.

[0177] As the numerical evaluation to the pixel profile immediatelyafter deforming the pixel profile which becomes the origin of the pixelprofile of the projection image, and its projection, it considers as theevaluation value mainly concerned with the CTF and the full width athalf maximum (FWHM).

[0178] The full width at half maximum in the case of carrying outdisplacement of the optical location from the optical-axis shift unit tothe pixel which deformed the pixel profile, and the definition of CTFare described below.

[0179]FIG. 6A and FIG. 6B are diagrams for explaining the definition ofthe full width at half maximum.

[0180] In FIG. 6A, the pixel S1 a of the 1st sub-field and S1 b are theMing displays (white display) among the 1st- the 4th sub-field S1-S4,and pixel S4 a of the 4th sub-field and S4 b are dark displays (blackdisplay).

[0181]FIG. 6B shows the cross section of the pixel profile, as indicatedby the dotted chain line, which passes pixel S1 a to pixel S4 b.

[0182] The full width at half maximum is expressed with the value (W/P)[%] standardized the pixel periodicity P with which the width of face Wof the value of the half of pixel peak intensity is projected on all thesub-fields at the time.

[0183]FIG. 7 is a diagram for explaining the definition of CTF accordingto the present invention.

[0184] The horizontal axis is the relative position of the directionperpendicular to the optical axis of the pixel or the projection pixel,and the axis of ordinate is the optical intensity of the pixel or theprojection pixel.

[0185] As shown in FIG. 7, when the image input to the spatial opticalmodulator repeats white and black in the shape of a line, as for thepixel or the projection image, the black level comes floating.

[0186] If the maximum of projection image intensity is set to P1 and theminimum value is set to P0, the CTF (contrast transfer function) will bedefined by the following formula (1).

CTF=(P1−P0)/(P1+P0)×100%   (1)

[0187] This corresponds to MTF (modulation transfer function) which isthe spatial transfer function, that the origin is the line & tooth spaceof the rectangle configuration by the spatial optical modulator differsfrom the actual spatial frequency and the frequency of the unit by theFourier expansion.

[0188]FIG. 8A and FIG. 8B are diagrams for explaining the definition ofCTF when using the pixel-profile deformation unit and the optical-axisshift unit.

[0189] The profile 1 indicated by the solid line in FIG. 8B is theprofile in case pixel S1 a of the 1st sub-field S1 and S1 b are the Mingdisplays, and the profiles 2 indicated by the dotted dash line in FIG.8B are pixel S4 a of the 4th sub-field S4, and the profile of S4 b.

[0190] The intensity of the portion (indicated by the arrow portion ofFIG. 8B) which crosses pixel S4 a equivalent to the contiguity pixel ofpixel S1 a is called “skirt intensity.”

[0191] Hereafter, let the skirt intensity be the value standardized bythe maximum intensity of the pixel.

[0192] The CTF of the projection image will become high, so that theskirt intensity is small.

[0193] At the time, the projection images shown in FIG. 5A are CTF=40and the half-widthe 50 (% notation omitted).

[0194] As shown in FIG. 5A, in spite of being the resolution of thecharacter including square of the few number of the pixels of the 10pixels and the 12 pixels, it turns out that it is the projection imagewhich can decipher the “rose” character easily and provide high“resolution” and good “sharpness”.

[0195] On the other hand, the continuity of the white background and theblack line is uniform, and it turns out that it also provide theprojection image with good “smoothness of the field and the edge.”

[0196]FIG. 5B and FIG. 5C show the comparative example 1, and thecomparative example 2.

[0197] In the case of the CTF=40 and the half width=30 in the embodiment1, FIG. 5B and FIG. 5C show the projection images which correspond inthe case of the CTF=80 and the half width=50 respectively.

[0198] The embodiment 1 has “resolution” higher than the comparativeexamples 1 and 2, and good “sharpness” so that FIG. 5A which shows theresult of the embodiment 1, and FIG. 5B which shows the comparativeexamples 1 and 2 and FIG. 5C may be compared and understood.

[0199] Simultaneously, it turns out that “the smoothness of the fieldand the edge” is the good projection image.

[0200]FIG. 9A is the example 1 for reference used as an example of theprojection image for explaining the item of the subjectivity evaluationto the image quality of the projection image.

[0201]FIG. 9A is an example of the projection image measured by CCDarranged on the screen 9 when combining the pixel-profile, deformationunit 7 and optical-axis shift unit which are projected by composition ofthe embodiment 1 shown in the FIG. 1.

[0202]FIG. 9A is the example on which the case where it displayed in thewhite-character of the display in white is displayed, in order to makethe beam configuration easy to see not for the black character whichused the character of “R” (+“I”) for the usual image evaluation but forexplanation.

[0203] In this embodiment, the “R” is displayed as compared with thecharacter including 16 pixels which do not use the optical-axis shiftunit, by using 32 pixels which use the optical-axis shift unit, and theprojection image according to this embodiment has high “resolution” andgood “sharpness.”

[0204] However, the full width at half maximum of the pixel is small,and it is the projection image which is inferior to some in thevisibility in that “the smoothness of the field” lacks in the thickwhite line which constitutes “R.”

[0205] Similarly, although “the smoothness of the edge” has improved bygradation control, it is the projection image inadequate for some.

[0206] However, such fault is changing CTF and can improve.

[0207]FIG. 9B shows other examples of the projection image forexplaining the item of the subjectivity evaluation to the image qualityof the projection image.

[0208]FIG. 9B is an example of the projection image measured by CCDarranged on the 9th page of the screen when omitting and projecting thepixel-profile deformation unit 7 and the optical-axis shift unit out ofthe composition of the embodiment 1 as shown in FIG. 1.

[0209] In FIG. 9B, since it is displayed in the character in which thecharacter of “R” (+“I”) consists of the number of the pixels with asquare of with the 16 pixels, the “resolution” and the “sharpness” havedeteriorated.

[0210] It is the image in which the “hardness” and the “jaggies” areconspicuous though it fully observes and evaluates from a distance,since the pixel of the rectangle configuration is projected.

[0211] However, about the white ground and black figures, it has“smoothness of the field” good enough.

[0212] The comprehensive result when forming the projection image forevaluation by calculation and the experiment, and carrying outsubjectivity evaluation is shown in Table 1 like the FIG. 5 of theembodiment 3.

[0213] The projection image for evaluation is evaluated, after alsochanging the location and characteristics of the projection lens andoptimizing, while changing the optical characteristics of thepixel-profile deformation unit. TABLE 1 CTF Skirt Intensity Half-Width(%) (%) (%) 30 40 50 60 70 80 30 54 D E D E E D 40 43 D C B B B D 50 33B B A A A D 80 11 B E A E A D

[0214] Concerning the rating of image quality in Table 1, A indicatesvery good, B indicates good, C indicates acceptable, D indicatesnon-acceptable, and E indicates non-evaluation. Plural evaluations ofthe image (the embodiment 4) for the gradation, the sharpness and thenoise have been given by ten observers based on the five phases ofscaling which is the series criteria method. The result of 4.5 or moreis Rating=A, the result of 4 or more points is Rating=B, the result of 3or more points is Rating=C, the result of less than 3 points isRating=D.

[0215] Subjectivity evaluation performed the projection image forevaluation to the ten observers based on the five phases of scalingwhich is the series criteria method.

[0216] The “sharpness” and the “jaggies” of the image which are mainlythe index concerning the “smoothness of the field and the line” of theimage using the evaluation based on the five phases of the scaling.

[0217] Although the above is the result of being related when increasingthe number of the pixels the 4-fold (=2×2) imaging, when the number ofthe pixels is increased the 9-fold (=3×3) imaging, it will become largewith the value.

[0218] It is because the lap arises between the pixels, the CTFdeteriorates and the quality of image deteriorates, since it is theconfiguration where the profile lengthened the foot.

[0219] When the level which shifts the optical axis by the optical-axisshift unit is three or more pixels (except two), it is desirable thatthey are 0.7×2/3 times the rate of the pixel size reduction.

[0220] The image of the same convolution as the twice as many theoptical-axis shift can be acquired by this, and degradation of theresolution by the cross talk between the adjoining pixels can be reducedalso in the 3-fold or 4-fold one as many optical-axis shift as this.

[0221] As shown in Table 1, when the pixel profile is deformed into thepixel profile which is not the rectangle configuration, it turns outthat the good projection image is acquired for the full width at halfmaximum also by the case of 70 at the maximum.

[0222] Moreover, even if CTF is 40% or more, it turns out that the goodprojection image is obtained. It is desirable that the CTF is less than80% and more than 40%. It is more desirable that the CTF is less than70% and more than 50%.

[0223] When the full width at half maximum is 70% or less and the CTF ismore than 50% at the maximum, it turns out that a very good projectionimage is acquired.

[0224] Moreover, although not indicated in Table 1, most image qualitycan improve the optical use efficiency greatly by making the full widthat half maximum larger than 50%, without making it deteriorate, it ismore desirable, from the point of acquiring the bright image, that thefull width at half maximum is larger than 50%.

[0225] In the case of the pixel-profile deformation unit 10 by themicro-lens array which is united with the LCOS of composition of havingbeen shown in FIG. 4, the thickness of the transparent substrate 11 isset to t, the radius of curvature is set to r, and the thickness of theadhesives layer 14 is set to 4 micrometers, with the index of refraction1.4.

[0226] The model A of Table 2 is the embodiment 5 more at the detail.

[0227] The CTF on the plane of projection when using the pixel reductionoptical system and the full width at half maximum, and the optical useefficiency of the optical system are searched for in ray-tracingsimulation.

[0228] The models B and C which are the following examples of comparisonare also indicated to Table 2. TABLE 2 n t (μm) r (μm) CTF (%) η (%) α(%) Model A 1.84 10 21.2 81.5 59.4 71.0 Model B 1.75 22 10 70.0 57.650.3 Model C 1.75 13 13 64.6 56.7 51.7

[0229] The models B and C of the example of comparison are the same asthat of the embodiment 5 except being the pixel-profile deformation unitfrom which the pixel in the plane of incidence serves as half, and thefull width at half maximum serves as about 50%.

[0230] Compared with Models B and C, Model A is understood that CTFwhich optical use efficiency is not concerned about the same, butexpresses definition ability is high.

[0231] Moreover, the burden to the pixel reduction optical-system designwith the larger full width at half maximum than 50% can decrease,therefore it can raise both definition ability and optical useefficiency.

[0232] Let the micro lens (convex configuration 16), the index ofrefraction n of the transparent substrate 11 and thickness t of thetransparent substrate 11, and the radius of curvature r of the microlens (convex configuration 16) be the pixel reduction optical systems ofthe publication in the composition of the FIG. 4 at the model D of Table3.

[0233] In the embodiment, there is about 83% of optical use efficiencyof the pixel reduction optical system.

[0234] The data of Models B and C are also written together to Table 3as an example of comparison.

[0235] Since the good projection image is acquired from Table 3 andTable 1 even if the definition ability (CTF) of the projection image isnot necessarily high, and CTF and optical use efficiency have therelation of the trade-off from it, if it holds down to the engineperformance lower if CTF is 40% or more, the projection image displayapparatus with the optical high use efficiency of the optical system canbe offered. TABLE 3 n t (μm) r (μm) CTF (%) η (%) α (%) Model D 1.63 2010 40.5 82.8 55.0 Model B 1.75 22 10 70.0 57.6 50.3 Model C 1.75 17 1364.6 56.7 51.7

[0236] In this-embodiment, it is assumed that the full width at halfmaximum is less than 70%, and the skirt intensity CTF is larger than50%.

[0237] Let the micro lens (convex configuration 16), the index ofrefraction n of the transparent substrate 11 and thickness t of thetransparent substrate 11, and the radius of curvature r of the microlens (convex configuration 16) be the pixel reduction optical systems ofthe publication in the composition of the FIG. 4 at the model F of Table4.

[0238] Model F is an example to which the full width at half maximum ofthe projection pixel profile fills CTF>=50% of the projection image withless than 70%.

[0239] As an example of comparison, Model G is written together to Table4.

[0240] With Model G, in the example from which the full width at halfmaximum becomes 70% or more, it is high, but on the other hand the partwith the small reduction effectiveness and the optical use efficiencybecome the definition ability CTF of the projection image very small.

[0241] 50% shows that P0/P1=0.33, i.e., the relative intensity of theportion which crosses the contiguity pixel, are 33% from the formula 1in CTF of the projection image.

[0242] Therefore, the projection image display apparatus with the fullwidth at half maximum sufficient the balance with the optical system bywhich the profile from which less than 70% and the skirt intensitybecome less than 33% is obtained and the optical use efficiency on theplane of incidence is obtained like this embodiment.

[0243] More preferably, the full width at half maximum is larger than30% and less than 70%, and the skirt intensity is less than 33%.

[0244] On the above condition, the jaggies of the image that are easilyconspicuous can be reduced. TABLE 4 n t (μm) r (μm) CTF (%) η (%) α (%)Model F 1.63 35 10 57.0 61.2 60.1 Model G 1.52 30 10 27.5 90.0 98.4

[0245]FIG. 10 shows the characteristics of an example of the pixelprofile according to the embodiment 8 of the invention which is deformedinto a pixel profile having the pixel of the rectangle-like pixelprofile and the shape of a concave near the center of the pixel.

[0246] As the profile of each pixel on which it is projected by thescreen in the embodiment is shown in FIG. 10, it becomes thecircumference of the pixel. At the relative positions (−0.1 to +0.1) ofthe horizontal axis of FIG. 10, the optical intensity drops.

[0247] The pixel is shifted by the optical-axis shift unit, and the caseof the image used as the maximum spatial frequency, i.e., the displayimage to which the contiguity pixel repeats ON and OFF, it becomes as itis shown in FIG. 11, when the profile in the screen is calculated.

[0248] When the circumference intensity of one pixel profile on which itis projected falls, the good image is acquired even if it displays theimage used as the maximum spatial frequency.

[0249] The good visibility by higher resolution and the smooth image andoptical, still higher use efficiency are realizable by not being therectangle-like, and realizing the pixel profile of the specialconfiguration which has the 0/00{haeck over (s)} in the center sectionupwards by the original pixel or the pixel on the screen, andcontrolling the configuration appropriately.

[0250] Although the is the same as the configuration of the two crests,the power intensity against the ends is distributed, the opticalintensity which is the original pixel is the ends side of the edge andthe center of the pixel, and it will be concentrated inside the edge.

[0251] Furthermore, although the spatial frequency which the female ofthe center section of the one pixel gives is high, and MTF of theprojection lens and the observer's MTF serve as the small spatialfrequency and can measure in CCD, in actual subjectivity evaluation, thevisibility is low and the point does not pose the problem.

[0252] For the reason, from the shape of a conventional rectangle, sincethe portion of the shoulder of the edge has curvature, though betweenthe pixels which adjoined laps, the edge rises, and it is bad invisible.

[0253] On the other hand, the visibility with the flat luminance whosepeak of the two crests is the pixel is given, in the case of theconventional rectangle profile, and the pixel portion where the recessis small, which does not lap since it cannot elapse and judge is checkedby looking with the pixel with flat good luminance.

[0254] The optical energy of the female of the center section becomestwo crest portions, from considering as near the edge of the adjacentpart between the pixels with which it does not lap when carrying out theoptical-axis shift, the smoothness, simultaneously sharpness are alsorealized and high resolution can be realized

[0255] If it becomes blunt with the rectangle drawing projection lens,to the inclination which the edge of both shoulders falls by making thecenter section into the convex, and becomes in sine, the pixel profilewith the female of 2 crests will have the small ratio from which thecenter section becomes the convex to the ratio from which the edge ofboth shoulders falls, and it will be hard to be influenced of MTFdegradation.

[0256]FIG. 12A (Rating B), FIG. 12B (Rating B), and FIG. 12C (Rating C)are the examples of the results of calculation concerning the projectionimage including the projection pixel on the screen 9 when using thepixel-profile deformation unit 7 in the composition of the embodiment 1which showed the pixel-profile deformation unit to FIG. 1 united withthe LCOS similar to the case of the embodiment 3 of the presentinvention using the optical-design evaluation tool.

[0257] Table 5 shows the comprehensive result when forming theprojection image for evaluation by calculation and the experiment, andcarrying out subjectivity evaluation as well as the case of Table 1 ofthe embodiment 4 (minimum value of the recess intensity estimated as thebest and good image [%]).

[0258] In Table 5, the projection image for evaluation is evaluated,after also changing the location and characteristics of the projectionlens and optimizing, while changing the optical characteristics of thepixel-profile deformation unit. TABLE 5 α (%) 50 60 70 CTF (%) 40 0 4080 50 0 40 80 60 0  0 80

[0259] In this embedment, as shown in Table 5, if the recess intensityis 40% or more of peak intensity preferably, the good image will beacquired.

[0260] Furthermore, if it is the projection pixel profile morepreferably so that it may become 80% of peak intensity, it will providethe projection image display apparatus having high optical useefficiency. However, the “smoothness of the image” deterioratesconversely when the peak intensity is 100%. For the reason, it isdesirable that the peak intensity is 95% or less. It is more desirablethat the peak intensity is larger than 80% and less than 90%.

[0261] If the full width at half maximum is less than 60% in general,even if the pixel profile has the depression of the center of the pixel,the good projection image is acquired from the simulation result (Table5) of the above-mentioned pixel profile.

[0262] Furthermore, when the central depression portion is the pixelprofile which is about 80% of the maximum intensity, the projectionimage with the full width at half maximum good (it is at least less than70%) is acquired.

[0263] In this embodiment, the ray-tracing calculation investigated theprofile on the plane of incidence when displaying one pixel or one line,is used with the index of refraction of the micro lens (convexconfiguration 16) in the composition of FIG. 4 and the index ofrefraction of the transparent substrate 11 being set to 1.75, thethickness of the transparent substrate 11 being set to 15 micrometers,and the radius of curvature of the micro lens (convex configuration 16)being set to 10 micrometers.

[0264]FIG. 10 shows the result of the above calculations.

[0265] In FIG. 10, the horizontal axis expresses the location on theplane of incidence, and the axis of ordinate expresses the intensity ofthe projection image.

[0266] Table 6 shows the characteristics of the image on the plane ofincidence acquired in this embodiment. The intensity of the center ofthe pixel is about 56% of the peak. Preferably, if the intensity of thecenter of the pixel is the profile of the shape of a concave whichbecomes 40% or more of the peak, it will be the image used as themaximum spatial frequency when carrying out the wobbling, and the betterimage will be acquired. TABLE 6 n t (μm) r (μm) CTF (%) η (%) α (%)Model H 1.75 15 10 79.4 53.1 57.5

[0267] As shown in Table 6, the characteristics which are notinferiority compared with the above comparative examples are acquired.

[0268] Moreover, from the result of Table 5, if the full width at halfmaximum of the projection image is about 50%, it would not be influencedby the intensity of the portion which crosses the contiguity pixel, butthe intensity near the pixel center may fall to 0.

[0269] The good projection image is acquired by this embodiment, usingthe micro-lens array shown in the model A in Table 2, the model D inTable 3, the model F of Table 4, and the model H in Table 6 as the pixelreduction optical unit.

[0270] Although the pixel reduction optical system is installed'in nearand the space modulator itself of the spatial optical modulator in eachembodiment, the need of adhering to especially these composition may becomposition which there is not and has arranged the micro lens betweenthe micro-lens array and the spatial optical modulator.

[0271]FIG. 13 shows an example of the pixel-profile deformation unit foruse in the image display apparatus of the embodiment 11 of the presentinvention.

[0272] As shown in FIG. 13, the pixel-profile deformation unit 21 ofthis embodiment includes a gradient-index lens array 22 corresponding tothe pixel pitch of the spatial optical modulator in the pixel reductionoptical system, as shown in FIG. 13. In the lens array 22, therefractive index is distributed therein.

[0273] In FIG. 13, reference numeral 23 is the liquid crystal layer, 24is the flattened layer, and 25 is the back plain.

[0274] The good image is acquired by providing the gradient-index-lensarray 22 of this embodiment so that it may become the same range as thecase of the previous embodiment having the profile of the projectionpixel mentioned above.

[0275] The case of the form of the operation may also be the compositionwhich has arranged the micro lens between the spatial optical modulatorand the gradient-index-lens array 22.

[0276]FIG. 14 shows an example of the image display apparatus accordingto the embodiment 12 of the present invention.

[0277] As shown in FIG. 14, the reflection-type liquid crystal unit isused for the pixel-profile deformation unit 31 of the embodiment as aspatial optical modulator, including the transparent substrate 32, theliquid crystal layer 33, and the back plain 34, and the TFT for the backplain 34 driving the liquid crystal etc. is accumulated.

[0278] With the conventional reflection-type liquid crystal unit (theliquid crystal unit called especially the LCOS), the maximum surface ofthe back plain is the reflector plate.

[0279] The reflector plate of the pixel-profile deformation unitincludes a concave surface mirror array 35, and the concave surfacemirror array 35 and the liquid crystal layer 33 of the embodiment 12includes the flattened layer 36. The concave surface mirror array 35includes the concave surface mirror.

[0280] As a liquid crystal unit, although the transference electrode,the orientation film, etc. are required suitably, since these detailedexplanation is unnecessary, for explanation of the pixel reductionoptical system, it is omitted by view 14.

[0281] In FIG. 14, the index of refraction of the flattened layer 36 isset to 1.52, and the radius of curvature of the concave surface mirrorarray 35 is set to 150 micrometers. A description of the thickness ofthe liquid crystal layer 33 and the thickness of the transparentsubstrate 32 will be omitted as they are negligible with respect to theeffectiveness of the embodiment.

[0282] When the ray-tracing calculation is carried out with thecomposition of the embodiment 12 of the invention, the characteristicsshown in Table 7 are acquired.

[0283] As is apparent from the results of Table 1 and Table 7, theembodiment 12 makes it possible to prove good efficiency and highresolution projection image. TABLE 7 CTF (%) η (%) α (%) 81.9 80.1 70.1

[0284]FIG. 15 shows an example of composition of the embodiment 13 ofthe present invention. In this embodiment, the pixel reduction opticalsystem is configured by using the aperture array.

[0285] The reflection-type liquid crystal unit 41 of the embodiment 13is provided as a spatial optical modulator, and it includes the liquidcrystal layer 42, the covered parts 44 and the micro lens 45 to whichthe pixel reduction optical system limits the aperture 43 to the liquidcrystal layer 42 or in the vicinity of the liquid crystal layer 42.

[0286] In FIG. 15, reference numeral 46 is the transparent substrate,and reference numeral 47 is the back plain.

[0287] Usually, the liquid crystal unit makes small magnitude of thepixel of spatial optical-modulator 41 the very thing by lowering therate of the aperture positively conversely in the embodiment, althoughthe device which makes the rate of the aperture high is made.

[0288] Table 8 is the result of calculations by changing the area of thecovered part 44 to three different values.

[0289] If the rate of the aperture is made 60%, the CTF which shows thedefinition ability of the projection image will be 100%.

[0290] That is, the contiguity pixel by which the wobbling is carriedout is not crossed. TABLE 8 Aperture Ratio (%) CTF (%) η (%) α (%) 8047.5 79.2 85.2 70 83.3 69.3 79.9 60 100.0  59.4 77.5

[0291] The full width at half maximum of the projection pixel profile ofthe embodiment 13 is about 78%, and according to Table 1, it is close tothe image (the full width at half maximum is 80% or more) which is notgood.

[0292] However, since CTF is high, the high resolution image is acquiredin Table 8.

[0293]FIG. 18 shows an example of composition of the embodiment 14 ofthe image display apparatus of the present invention.

[0294] Specifically, FIG. 18 shows the cross section of thereflection-type light valve which has the concave mirror used as thepixel-profile deformation unit for every pixel in the reflection-typeimage display apparatus which increases the resolution of the originalreflection-type light valve using the optical-axis shift unit.

[0295] Only the basic composition of the reflection-type light valve isshown in FIG. 18.

[0296] As shown in FIG. 18, the picture element used as the spaceoptical modulator includes the reflective concave surface configuration51, the embedding layer 52 which is the layer of a transparent material,and the liquid crystal layer 54.

[0297] The reflection electrode 56 is provided between the reflectiveconcave surface configuration 51 and the embedding layer 52.

[0298] On the embedding layer 52, the flattened layer 53 is provided.The transparent electrode 57 is provided above the upper surface of theflattened layer 53 and under the liquid crystal layer 54. The oppositesubstrate 55 is formed on the liquid crystal layer 54, and thetransparent electrode 58 is separately formed in the liquid crystal sideof the opposite substrate 55.

[0299] Although illustration is not carried out for the transferenceelectrode 57 and the reflector 56, they are separately provided forevery pixel, and they are electrically connected together by thethrough-hole filling material 59.

[0300] The index of refraction of the embedding layer 52 is set to n,and the radius of curvature of the concave surface reflector plate 51 isset to r.

[0301] The SiO₂ substrate with the elevated-temperature pSi, or thesilicon substrate is used for the substrate of the reflective concavemirror 1.

[0302] The thin films, such as ITO, are used for the electrode 57 withthe thin film of the metals, such as aluminum, transparent again by thereflector 56.

[0303]FIG. 19 shows the outline of the operation of the embodiment 14 ofFIG. 18.

[0304]FIG. 19 shows the condition that the image of the pixel is formedby operation and the reflective concave mirror of irradiation beam inthe embodiment 14 of FIG. 18.

[0305] As for the incoming light 60, only the parallel light is shown inFIG. 19. The incoming light 60 passes through the liquid crystal layer 4and the translucent flattened layer 53, and is incident to thereflective concave mirror 51. It is reflected and focused by thereflective concave mirror 51, and the new reduced pixel 62 is in thefocusing state of the pixel near portion 61, and the focal point f towhich the pixel size is reduced is formed.

[0306] In FIG. 19, the reduced pixel 62 has spread because the light rayof the light source spreads, and there is the lighting angle (angle ofdivergence) (see FIG. 20).

[0307] When it sees geometrically, the magnitude of the reduced pixelhas the magnitude according to the lighting angle and the focaldistance. According to the yield, the reduced pixel becomes stilllarger.

[0308] In projecting the pixel profile of the reduced pixel thatdeformed on the screen using the projection lens, corresponding to thetransfer function of the projection lens, it receives the deformation ofthe further pixel profile.

[0309] However, the reflection light from the pixel can form thefocusing state by which pixel reduction is carried out at the nearportion 61 the focal location of the reflective concave mirror 1 byoptimizing these.

[0310]FIG. 20 shows the relation between maximum angle θ in at the timeof incidence to the pixel, and maximum angle θ out at the time ofreflection or outgoing.

[0311] The θ in is determined by the irradiation optical system, andabout the incident light to irradiate, although it is the fixed value,the θ out changes with n and r.

[0312] In FIG. 20, although the θ out is considering as the angle ofabout half of the spreading of the light ray, when the pixel size isreduced to about ½, it serves as the twice as many the angle (±θ out) asthis.

[0313] Since the pixel profile in the focusing state where pixel size isreduced is near the focus of the optical element as shown in FIG. 20,the include-angle distribution of the irradiation beam to the pixel alsoinfluences greatly.

[0314] It is desirable for the rates of reduction of the pixel to differgreatly, and to optimize these by characteristics, the locationrelation, etc. of the contour configuration of the pixel itself, thecurvature profile of the concave mirror, and the projection lens.

[0315] When carrying out pixel reduction of the reflection light withthe concave mirror, it is not only necessary to set the pixel size toone half. P The pixel profile which deformed when performinghigh-resolution imaging using the optical-axis shift unit is not onlythe rate of reduction of the pixel, and the visibility, such asresolution of the image and the smoothness, is not necessarilydetermined.

[0316] Also in the same rate of pixel reduction, if the pixel profilesdiffer, it may become the greatly different visibility.

[0317] Even if pixel size is not ½, the big difference may not beaccepted in the visibility.

[0318]FIG. 21 shows the embodiment 15 of the image display apparatus ofthe present invention.

[0319] The pixel profile which acts as reflection from the reflectiveconcave mirror by the reflection-type light valve which can set theembodiment 14 (it acts as reflection from the pixel) is deformed, andthe unit for which the pixel to which pixel size is reduced modulatesthe light path (it shifts spatially) shows operation which increases thenumber of the pixels (image of the pixel).

[0320] In the embodiment, the piezoelectric elements 72 and 73 are usedas means to modulate the light path of the light which acted asreflection from the pixel of the spatial optical modulator 71 (it seesat right angles to the optical axis).

[0321] This moves mechanically special modulation unit 71 by using thepiezoelectric elements 72 and 73.

[0322] In order for the unit itself to move, the pixel will also move.

[0323] If the piezoelectric element is used, even if pixel size will beabout ten micrometers or less, the light path not more than it can beshifted.

[0324] The piezoelectric elements 72 and 73 are installed in the y-axisorientation 75 and the x-axis orientation 76 on the spatial opticalmodulator 71 and the jig 74, and they are moved periodically.

[0325] In addition, the z-axis is the direction perpendicular to thesurface of the drawing, and is in agreement with the optical axis.

[0326] The pixel profile which acts as-reflection from the reflectiveconcave mirror by the reflection-type light valve in the embodiment 14of FIG. 18 is deformed as in FIG. 22A to FIG. 22G, it is projected onthe pixel to which the pixel size is reduced by the screen by theoptical-axis shift unit in the embodiment 15 of FIG. 21, and operationfrom which it becomes the image of the high resolution is shown.

[0327] Here, the rate of reduction (α) of the pixel size by themicro-lens array is set to one half.

[0328] The pixel of the spatial optical modulator is the square, and itis the square reduction image-noting that it is reduced ideally.

[0329] The initial state which is not moving probably is set to thestate of FIG. 22A.

[0330] The state where the pixel size of the spatial optical modulatormade it shift ½ in the direction of y is set to the state of FIG. 22B.

[0331] When the pixel size is set to 14 micrometers, delta x and delta yare set to 7 micrometers.

[0332] The state where the pixel size is made to shift by ½ from thestate of FIG. 22B in the x directions is the state of FIG. 22C.

[0333] The state where pixel size made it shift by ½ in the direction(the minus direction) opposite to FIG. 22B is the state of FIG. 22D.

[0334] The state where it is made to shift in the direction opposite toFIG. 22C is the sate of FIG. 22E.

[0335] The state where pixel size made it shift ½ in the direction of yis the state of FIG. 22F.

[0336] Subsequently, it returns to the state of FIG. 22A.

[0337] Consequently, the high precision imaging (FIG. 22G) is performedso that the size of the one side of the pixel is ½, and it is the 4-foldhigh resolution imaging that can be realized without sensing the flickerof the image, if the periodicity of these shifts is small.

[0338] Moreover, in the example, since the optical system is extendedsince the spatial optical modulator and light-path modulation meansbecome the one device, and it becomes unnecessary to intercalatelight-path modulation equipment, it leads to the miniaturization ofequipment.

[0339] Although the above-mentioned example is moved in the twodirections of x and y, it is possible to be the shift of the directionof either x or y. In this case, the pixel size is doubled.

[0340] Moreover, the 9-fold high resolution imaging as many increase inthe number of the pixels as the can expect the amount of shifts by ⅓,then 3×3, using alpha as one third.

[0341] What is necessary is just the light-path shifting unit whichshifts the light path in space coordinates, also besides moving thereflection-type light valve mechanically directly, using the opticalelement using the liquid crystal which is the double-refractionmaterial, the parallel shift of the optical axis may be carried out, theoptical axis may be deflected, or the optical-axis shift unit of FIG. 21may perform simultaneously the parallel shift of the optical axis, andthe deviation of the optical axis.

[0342] It is possible to carry out the displacement of the transparentmember from which the wedge configuration and the optical path arrangedaslant differ mechanically.

[0343]FIG. 23 shows the embodiment 16 from which the pixel to which thepixel profile which acts as reflection from the reflective concavemirror by the reflection-type light valve which can set the embodiment14 of FIG. 18 is deformed into based on operation shown by FIG. 22A orFIG. 22G, and pixel size is reduced serves as composition of the imagedisplay apparatus which is projected by the time sharing by the screenby the optical-axis shift unit in the embodiment 15 of FIG. 21, andrealizes the image display of the high resolution.

[0344] Specifically, it is related with the high precision imageprojection equipment (projector) which uses the above-mentioned imagedisplay apparatus of high precision imaging.

[0345] As an example, the example of the veneer formula projector whichuses one reflection-type spatial optical modulator is shown.

[0346] In FIG. 23, as for the light which came out of the white lightsource 81, the illuminance is first equalized by the equalizationoptical elements (optical integrator) 82, such as the fly eye lens.

[0347] Next, the color separation units 83, such as the color wheel,separate into the three colors of red, green, and blue.

[0348] When the color wheel is used, simultaneously, it does notseparate into red, green, and blue, but red, green, and blue separateinto the time series.

[0349] Next, it goes into the polarization beam splitter 85 for everycolor, is reflected by the pixel of the spatial optical modulator(reflection-type liquid crystal light valve) 84, and escapes from thepolarization beam splitter 85, and finally, it is projected with theprojection lens 86 and the high precision image is formed in the screen87.

[0350] Besides LCOS which is the reflection-type light valve given inthe embodiment 14 of FIG. 18 as a spatial optical modulator, the MEMStechnique may be used like DMD and the reflection-type deviation unitmay be used.

[0351] Moreover, the method using the spatial optical modulator is notrestricted to the veneer formula of FIG. 23, and its reliance is alsogood at 3 plate type and 2 plate type.

[0352] Since the spatial optical modulator combines with theoptical-axis shift unit, it is desirable that it is the thing of thehigh-speed response.

[0353] The image display apparatus which is made to expand the image andis displayed is sufficient by using the magnifying lens forvirtual-image formation in which the virtual-image display like themagnifier is possible, and expanding as a virtual image besides theequipment which displays the image of the high resolution which expandedthe reduced pixel by which the pixel profile is deformed like theprojector shown in FIG. 23 by the imaging with which the relation of theconjugate is filled using the projection lens.

[0354] Thereby, it is possible for the image display apparatus of thisembodiment to provide a small display for the finder of a video camera,a head mounted display, a cellular phone, etc.

[0355] When the reflection-type light valve is combined with theoptical-axis shift unit in the present invention and the high resolutionis displayed using the reflection-type pixel reduction unit, thedifference in the action when comparing with the case where the pixelreduction by the micro lens on the conventional opposite substrate isused is explained below.

[0356] It sets to the reflection-type light valve with the compositionshown in the FIG. 18 of the embodiment 14 and FIG. 21, and FIG. 23.

[0357] The time of making the opposite substrate, since the requiredoptical element of alignment is not prepared in the silicon substratewhich has the reflector, and the substrate which counters unlike thecase where the conventional micro lens is prepared in the light sourceside when the pixel profile is deformed, it is necessary to use neitherlarge sum superposition equipment nor the vibration-proofing facility atthe time of attachment.

[0358] Moreover, when the yield of attachment also improves greatly, theimaging can be carried out easily at low cost.

[0359] Since the pixel profile does not change even if the horizontallocation gap with the opposite substrate arises after attachment, itcomes to excel in dependability.

[0360] By the glass substrate and silicon substrate which are usuallyused as an opposite substrate, since the difference is in thecoefficient of expansion, the process temperature at the time ofproduction and the use environment as a product had big restrictions.

[0361] In the silicon substrate of 1 inch of vertical angles, and theusual optical glass, even the temperature change of 10 degrees producesthe dilation difference for several microns location gap at the ends.

[0362] In the temperature change of 100 degrees in the process of120-150 degrees of adhesion hardening, there is the dilation difference10 microns or more for the location gap.

[0363] These serve as location gap directly, or damage the liquidcrystal spacer, or serve as camber and deteriorate the characteristicsof the reflection-type light valve.

[0364] However, the influence of location gap is cancelable, and whileit is more at low cost and can produce, the dependability under thesevere environments, such as the cold district and in the car in summer,can be improved greatly.

[0365] Since the influence does not exist although the absolute locationgap increases even if it uses the 2 inches large-sized reflection-typelight valve, making the reflection-type light valve large-sized can alsoimprove resolution more.

[0366] Since the unit which deforms the pixel profile into thesilicon-substrate side is prepared unlike the case where theconventional micro lens is prepared in the light source side when thepixel profile is deformed in the reflection-type light valve with thecomposition shown in FIG. 18 of the embodiment 14 and FIG. 21, and FIG.23

[0367] The liquid crystal layer is again penetrated after that inresponse to the action of the optical element which deforms the pixelprofile after lighting light penetrates as it is first by using as theaperture the liquid crystal layer separately switched by polarizationrotation combining the polarization separation unit.

[0368] For the reason, even if the micro lens by the side of theconventional light source gives the focusing function in order to reducethe first pixel profile, it may be expanded to the return and may beunable to contract.

[0369] Although the focal distance of the micro lens can be changed, theone lens can be made to be both able to act effectively in the outwardtrip and the return trip and pixel reduction can also be performed

[0370] It is easy to receive limitation of the thickness of the lightingangle or the substrate, and the configuration of the micro lens etc.,and since it is the one lens, and the power of the lens in the outwardtrip and the return trip is inevitably the same, the resolution and theoptical capacity factor in the case of changing the pixel profile canalso fully use neither the brighter lighting angle nor the darkerprojection lens.

[0371] On the other hand, the micro lens of the present invention canact by the light path after it, without the liquid crystal layer of thebeginning of the outward trip acting. The resolution is better and itcomes to design the deformation of the pixel profile so that opticalefficiency may improve.

[0372] In the pixel-profile deformation by the micro lens prepared inthe conventional opposite substrate, the image profile of theunrealizable configuration is realizable. High-resolution imaging isrealizable.

[0373] It is the penetrated type micro lens and especially the F valuecan make the color yield with the very small big single lens there benothing in the case of the mirror.

[0374] Also at the point, dispersion by the color of the pixel profilecan be reduced greatly, and the high resolution can be conventionallyrealized now.

[0375] The present invention can improve resolution by decreasing thecross-talk of the contiguity pixels of the liquid crystal itself. Thecross-talk of the image which adjoins by preparing the electrode patternand the shading layer can be easily decreased now, and the image of thehigh resolution can be realized.

[0376] In FIG. 18, the concave mirror may not be limited to thespherical mirror and the aspherical mirror or the sculptured-surfacemirror is sufficient as it. It is possible to use two or more sheetscombining the plane mirror which does not have the curved surface.

[0377] By using for the mirror plane which countered the V charactertype aslant symmetrically by the two sheets, the level or perpendicularpixel profile of the either 1 direction can be deformed, and the pixelcan be reduced.

[0378] When the three or more sheets are used, the pixel can be reducedmore effectively and it is desirable.

[0379] By using the mirror plane of the four sheets which countered inthe two directions aslant like the reverse pyramid configuration, thepixel is reducible in the two horizontal and vertical directions.

[0380] By increasing the number of sheets of the mirror plane, the pixelis effectively reducible.

[0381] Since these do not need to form the curved-surface configuration,when the number of sheets of the mirror plane is about several sheets,they can be manufactured comparatively easily using the MEMS technique,and are low costs more.

[0382] In FIG. 18, since it is not necessary to form the liquid crystallayer 54 in the concave surface configuration by having the embeddinglayer 52, it is not necessary to prepare the convex configuration in theopposite substrate. Location doubling etc. becomes unnecessary and itallows easy attachment.

[0383] Since the index of refraction becomes at least 1.3 or more byembedding the transparent derivative material, without considering asthe air space and the focal distance f of the concave mirror (absolutevalue) is given by the formula: f=r/(nd) with the curvature r, and thediameter d and the index of refraction n, the focal distance of theconcave mirror can be made small by 30 percent or more to the air space,even if it is the same curvature.

[0384] Many aberrations, such as the spherical yield on the shaft of theconcave mirror, and the astigmatism besides the shaft, the coma, can begreatly decreased now, and it comes to be able to carry out the highresolution imaging more by reducing the rate of reduction of the pixelgreatly.

[0385] In FIG. 18, the flattened layer 53 which becomes the upper partof the embedding layer 52 from another transparent material is formed,and flattening processing of the flattened layer 53 is carried out bythe chemical polishing in the upper surface.

[0386] It is realizable to have formed the liquid crystal layer and tomake thickness of the liquid crystal layer by the the less than 1 micronof plus or minus, after forming the transference electrode and theorientation film on the flattened layer 53.

[0387] The good contrast and homogeneity within the field can berealized, and the homogeneity within the panel improves.

[0388] The flattened layer 53 may unify and embed the embedding layer52, and the layer itself may be used for it as a flattened layer.

[0389] In impressing the electric field to the liquid crystal, withoutforming the transparent electrode 57, the electric field can also bedirectly impressed by the reflector 56, and since the configuration issimple, it excels in dependability at low cost.

[0390] When the curvature of the concave mirror is small, or time pixelpitch is large (the concave surface configuration), the concave-convexdifference of the member 51 becomes large, and the case where theelectric field cannot be uniformly impressed to the liquid crystal layer54 arises.

[0391] For the reason, as shown in FIG. 18, the uniform electric fieldcan be impressed now to the liquid crystal layer within the pixel byforming the transparent electrode 57 separately on the flattened layer53.

[0392] The contrast of the image can be improved now.

[0393] Besides contacting electrically using the through-hole fillingmember, the transparent electrode 57 and the transparent reflector 56may make the embedding layer 52 thin, and may contact the transferenceelectrode 57 electrically directly in the edge portion of the reflector56.

[0394] In the composition of the embodiment 14 of FIG. 18, in order toevaluate the characteristics of the pixel profile quantitatively, thethree kinds of evaluation parameter: (1) the CTF (Contrast TransferFunction) and (2) the rate of reduction α(alpha), and (3) the useefficiency η(eta) are used.

[0395]FIG. 24A and FIG. 24B are diagrams for explaining the definitionof CTF.

[0396] The pixel profile is reduced by the pixel reduction unit from theoriginal square, and FIG. 24A is the outline view of the outer diameterconfiguration at the time of deformation.

[0397]FIG. 24B is the optical intensity distribution map used as thepixel profile which is a cross-sectional view of the space horizontaldirection of FIG. 24A.

[0398] As shown in FIG. 24A, while the three pixels 91 measured orchecked by looking are not the pixel profile but the continuous pixelprofiles of the perfect rectangle configuration as shown in FIG. 24Bwhen it actually evaluates quantitatively, they have the minimum valuesMIN other than zero.

[0399] In the embodiment, as shown in the formula (11), CTF is definedby using the maximum value MAX of the pixel profile and the minimumvalue MIN of the pixel profile.

CTF=(MAX−MIN)/(MAX+MIN)   (11)

[0400] However, the first waveform is made into the pixel square wave ofthe reflection-type light valve to the usual MTF being the transferfunction of the sine wave here.

[0401] For the reason, since it is CTF at the time of carrying out pixelreduction, the spatial frequency turns into the spatial frequency towhich the inverse of the pitch of the original pixel corresponds as itis.

[0402] Since the CTF is the transfer function of the square wave, sinceCTF is determined by the MTF characteristics of the low frequency, theyare not the number of the high frequency, and MTF of the specificspatial frequency and the thing which corresponds uniquely more exceptthe corresponding spatial frequency.

[0403] It is the same as that of MTF from the viewpoint of the limit ofresolution almost, and 50% or more of value of usual is however, morepreferably good 30% or more preferably at least 20% or more.

[0404] If it is 65% or more, as the visibility, it will be recognizedalmost like the original square wave.

[0405] The measurement of CTF is performed by combining the microscopeobject lens and the CCD light-receiving unit through the prism type beamsplitter.

[0406] Moreover, using the projection lens with which MTFcharacteristics differ instead of the microscope object lens, CCD hasbeen directly arranged to the field which arranges the screen used asthe conjugate, and is carried out to it.

[0407] The microscope object lens prepared the aperture as occasiondemands, and incorporated the 20-fold high resolution as many SLWD ofthe long working distance of NIKON as the, and the 40-fold one, and NAis controlled and used for it.

[0408] Its own thing is used for the projection lens.

[0409] The amount of CCD of the dark noise is removed and calculated.

[0410] If the ideal optical system is used to the pixel profile of therectangle configuration, the image on which it is projected on thescreen is the rectangle, and can realize the clear image.

[0411] Although such an image obtains the good result by subjectivityevaluation, carrying out the deer when image information is the few dataprojector in the conventional display of low resolution

[0412] The image quality which the feeling of the “jaggies” and thefeeling of “discontinuity of gradation nature” arose by subjectivityevaluation, and is not necessarily excellent in the display of theconventional high resolution beyond twice in the image display apparatuswhich is going to realize the “smoothness” of the image, or the imagedisplay apparatus of the image information with the main image displayof the video is not necessarily given.

[0413] These are combined also with the rate of reduction described tothe corresponding following as the rate of the aperture, and influenceimage quality.

[0414] The rate of reduction is the same composition as the opticalsystem by which CTF is evaluated, and is evaluated using the full widthat half maximum.

[0415] The rate alpha of reduction is defined by the following formula(12).

Picture element size of the full width at half maximum/spatialoptical-modulator of alpha=pixel profile   (12)

[0416] However, when the expansion optical system is used, it normalizedwith the dilation ratio, and when the rate alpha of reduction is 1.0 or100%, it could be twice, such as those without reduction.

[0417] This rate of reduction is important with CTF as a basis of highreduction of the image.

[0418] It turns out that it is in the state of fault reduction where thehigh precision image cannot become by the crevices other than theprofile becoming remarkable shortly even if the value is too smallconversely, although it is not reduced at all and cannot become the highprecision imaging from the viewpoint of the high precision imaging bypixel reduction when alpha is 1.0.

[0419] Then, it is experimented in the relation of the rate of reductionand image quality at the time of shifting the image using theoptical-axis shift unit by subjectivity evaluation.

[0420] The rate of reduction influences image quality greatly, when highresolving is formed using the optical-axis shift unit.

[0421] The result (embodiment 17) shown in Table 11 about the highreduction of the rate of reduction and the image is obtained fromsubjective evaluation of the image based on the profile as shown in FIG.24A.

[0422] Concerning the increase in the number of the pixels describedabove, they could be the 4-fold high resolution imaging.

[0423] The image evaluated the image including the pixel which has theimage profile from which alpha differs. TABLE 11 (Embodiment 17) α′ 0.250.35 0.4 0.5 0.6 0.7 0.8 1.0 Image Quality D C B B B B C D

[0424] Concerning the rating of image quality in Table 11, B indicatesgood, C indicates acceptable, and D indicates non-acceptable. Pluralevaluations of the image (the embodiment 17) for the gradation, thesharpness and the noise have been given by ten observers based on thefive phases of scaling which is the series criteria method. The resultof 4 or more points is Rating=B, the result of 3 points is Rating=C, andthe result of 2 or less points is Rating=D.

[0425] As shown in Table 11, when α′=1.0, the pixel image is not reducedat all and it is not a high precision image.

[0426] Although alpha′ of effectiveness is not remarkable at 0.8, thereis the difference as compared with the time of 1.0.

[0427] Therefore, the upper limit of alpha′ is considered to be 0.9order. It is preferable that it is less than 0.8 and larger than 0.35.It is more preferable that it is less than 0.7 and larger than 0.4.

[0428] Although alpha′ should be suitably small just only in the highreduction of the image by pixel reduction, when making the number of thepixels increase, the rate of reduction must be the value according tothe rate of increase.

[0429] Like the above-mentioned example, when the number of the pixelsis increased the 4-fold (=2×2) one, 0.5 order is more suitable foralpha′.

[0430] However, when the number of the pixels is increased the 9-foldone (=3×3) in the value, it is large.

[0431] Since it is the configuration where the profile lengthened thefoot, the lap arises between the pixels and CTF is because degradationand the quality of image deteriorate.

[0432] When the level which shifts the optical axis by the optical-axisshift unit is the three pieces [n or more] except two, it is desirablethat they are 0.8*2/3 times the rate of pixel size reduction of the.

[0433] Thereby, the image of the same convolution as the twice as manyoptical-axis shift as the can be acquired.

[0434] Also in the 3-fold or 4-fold one as many optical-axis shift asthe, degradation of the resolution by the cross talk between theadjoining pixels can be reduced.

[0435] More specifically, it is desirable that in the case of the 3-foldone, it is less than 0.53 and larger than 0.23. It is more desirablethat it is less than 0.46 and larger than 0.23.

[0436] As for alpha′, about 0.33 is the optimum value.

[0437] If the image is dark even if the image is high precision, it doesnot become good image quality, but use efficiency is also important.

[0438] As a scale which measures the, the use efficiency η about onepixel is defined in the following.

[0439] The use efficiency η is the ratio of the energy arrived at therange equivalent to one pixel on the screen to the energy reflected byone pixel on the light valve.

[0440] The definition of the use efficiency η at the time of projectingon the screen is shown in the following formula (13).

[0441] ti η=(energy(W)arrived at the range equivalent to one pixel onthe screen)/(energy reflected by one pixel on the light valve)   (13)

[0442] In the case of the ½ pixel reduction (alpha=0.5) where the pixelsize is simply reduced using the aperture of the shading layer only, theoptical use efficiency η is 25%. It is desirable that the range of η ismore than the level at least.

[0443] It is required to improve the above-mentioned value of CTF,alpha, and η appropriately about the high-resolution imaging using theoptical-axis shift unit.

[0444] The production of the reflection-type light valve of theembodiment 14 of the invention will be described in the following.

[0445] The transparent derivative layer is formed by the thickness ofabout 2 microns on the aluminium metallic-reflection electrode, usingthe silicon-substrate back plain for the usual LCOS as it is.

[0446] The film formation method produces the SiO₂ layer, the SiONlayer, the SiN layer, etc. by the PCVD, and the Al₂O₃ layer, the TiO₂layer, the ZnO layer, etc. by the EB evaporation coating and thespattering.

[0447] Then, after forming the through hole for contact in the edgeportion of the pixel, it is crowded in the aluminium metal into theportion with electrocasting.

[0448] Moreover, after forming the concave surface configuration resistlayer for transfer with the gradation nature mask, the concave surfaceconfiguration of about 0.5-2.0 microns is formed by dry etching.

[0449] Then, after forming the aluminium electrode on the whole surface,in order to prevent contact between the pixels, etching removes thecircumference portion.

[0450] Then, the transparent derivative layer is again formed by thethickness of the about 2 microns on the aluminium metallic-reflectionelectrode.

[0451] The film formation method produces the SiO₂ layer, the SiONlayer, the SiN layer, etc. by the PCVD, and the Al₂O₃ layer, the TiO₂layer, the ZnO layer, etc. by the EB evaporation coating and thespattering.

[0452] Then, after forming the 2nd through hole for contact in the edgeportion of the pixel, it is crowded in the aluminium metal into theportion with electrocasting.

[0453] Then, after carrying out the chemical polishing and forming theITO electrode on the whole surface, in order to prevent contact betweenthe pixels, dry etching removes the circumference portion.

[0454] Furthermore, the orientation film of the polyimide is applied onthe ITO film.

[0455] After this, similar to the usual LCOS, the attaching of thesubstrate to the opposing substrate, the assembly, the liquid pouringand the sealing are performed.

[0456] The reflection-type light valve of-the embodiment 14 of thepresent invention used for and estimated the optical-design evaluationtool by composition as shown in FIG. 23 as the CCD camera which hasarranged the projection image to the field expanded under the microscopeas substitution of the screen side to the evaluation of the condition onthe screen.

[0457] As an optical-design evaluation tool, the number of the rays oflight is made into about 200,000 using the light-tools (the 3rd edition)of the U.S. optical research association company in which thenon-sequential ray-tracing analysis is possible (when a 1-GHz CPU isused and it is the computational complexity for about 50 minutes).

[0458] In order to reduce the burden of calculation, the ray tracing isperformed only about two or more pixels of, the specific range, andcalculated and evaluated the optical intensity distribution in the largerange in the screen side by carrying out the convolution with thespecial calculation tool.

[0459] The value of 150W class DC discharge lamp of Ushio Co. is usedfor the high-pressure mercury lamp.

[0460] By the fly eye lens of 5×8, the lighting angle carried out designproduction so that the perpendicular lighting angle might become the7-fold one.

[0461] The projection lens installed the aperture equivalent to thething of high re-solving of F2.4.

[0462] Table 12 shows the embodiment 18 and the embodiment 19 of theinvention with which the evaluation value of the pixel reduction in thecomposition of FIG. 18 has been obtained.

[0463] The embodiment 18 uses the index of refraction n=1.83 of theembedding layer 2 and the radius of curvature: r=150 microns, while theembodiment 19 uses the index of refraction n=1.83 of the embedding layer2 and the radius of curvature: r=190 microns. The pixel pitch is 14microns. TABLE 12 CTF (%) η (%) α (%) Embodiment 18 80.9 74.7 52.8Embodiment 19 80.1 82.8 50.4

[0464] Moreover, the example 11 of comparison at the time of using themicro lens is shown in Table 13, and the example 12 of comparison isshown in Table 14.

[0465] The index of refraction is the index of refraction of the memberwhich has the convex configuration.

[0466] The members which have the shape of a concave are the photoresistadhesives of the fluorine system.

[0467] The index of refraction is n=1.4.

[0468] Thickness t is the distance of the heights of the member whichhave the convex configuration, and the liquid crystal layer, andcontains the average thickness of the 4 microns of the photoresistadhesives of the fluorine system.

[0469] When it is easy to become uneven with the thickness of the middlesubstrate and priority is given to the homogeneity within the field, asfor thickness t, it is desirable that it is the at least 20 microns ormore. The pixel pitch is 14 microns. TABLE 13 (Comparative Example 11)micro lens n = 1.63, r = 10 μm t (μm) CTF (%) η (%) α (%) 21 59.4 66.679.4 24 40.5 82.8 55.0 33 37.8 74.7 58.9

[0470] TABLE 14 (Comparative Example 12) micro lens n = 1.75, r = 10 μmt (μm) CTF (%) η (%) α (%) 19 79.4 53.1 57.5 22 54.2 64.8 53.4 26 70.057.6 50.3

[0471] It turns out that the way at the time of using the mirror canimprove simultaneously at least two or more evaluation values in CTF, η,and α, and can make reduction of the remaining evaluation value theminimum so that the embodiment 18, the embodiment 19, and the examples11 and 12 of comparison may be compared and may be known.

[0472] The embodiment 20 used as the evaluation value of pixel reductionof the embodiment of FIG. 18 at the time of embedding in FIG. 25, whencurvature r is fixed to the 100 microns, and changing the index ofrefraction of the layer to it is shown.

[0473] As shown in FIG. 25, the index of refraction of the embeddinglayer is desirably a larger one, and if the index of refraction is 1.6or more, the optical use efficiency becomes 90% or more. That is, it isthe optical loss of {fraction (1/10)} or less, and a high optical useefficiency can be obtained.

[0474] Moreover, with the index of refraction of 1.7 or more, theoptical use efficiency becomes about 97% or more, or the fixed useefficiency level. It is more desirable.

[0475] Since various transparent derivative materials can form the filmsor layers by the PCVD, the EB evaporation coating, the spattering, etc.with the index of refraction of 2.2 or less. If the material with theindex of refraction of 2.2 or less is used, the dry etching will easilybe carried out. The rate of reduction remains almost unchanged as theindex of refraction increase, but the optical use efficiency falls insuch a case. Hence, it is desirable that the index of refraction islarger than 1.7 and less than. 2.2.

[0476] As shown in the embodiment 20, the materials with the index ofrefraction of 1.6 or larger are more desirable than the usualtransparent materials with the index of refraction of less than 1.6 andlarger than 1.4; that is, SiO₂, BK7 and acrylic polymer, the “saitoppu”,and the 1737 glass (Corning Co.). The focal distance f of the concavemirror (absolute value) is given by the formula f=r/(nd) where theradius of curvature r, the diameter d, and the index of refraction n, asmentioned above.

[0477]FIG. 26 shows the rate of reduction which is the evaluation valueof the pixel reduction in the embodiment 21 of the invention whenchanging the curvature of the concave mirror. FIG. 27 shows the CTFwhich is the evaluation value of the pixel reduction in the embodiment21 of the invention when changing the curvature of the concave mirror.

[0478] In the embodiment 21, the embedding layer has the index ofrefraction n=1.6, and the pixel pitch is 14 microns.

[0479] As shown in FIG. 26, as for the rate of reduction, it isdesirable that the radius of curvature is larger than 30 microns andsmaller than 250 microns. It is more desirable that the radius ofcurvature is larger than 50 microns and smaller than 200 microns.

[0480] As shown in FIG. 27, like FIG. 26, the CTF changes rapidly and itis desirable that the radius of curvature is larger than 30 microns andsmaller than 250 microns. It is more desirable that the radius ofcurvature is larger than 50 microns and smaller than 200 microns.

[0481] In this embodiment, the rate of reduction is larger than 40% andsmaller than 50%. It is not a faulty reduction that degrades the imagequality.

[0482] The pixel profile is not the rectangle configuration, and it ispossible to secure a CTF in the range of 50% or more.

[0483] Thus, by using the optical-axis shift unit to the reduced pixelwhich deformed the pixel profile, the image display apparatus whichrealizes the very high-definition image which can realize the resolutionand the smoothness of the image simultaneously is realizable.

[0484] The pixel pitch in the embodiment 21 is 14 microns. In theembodiment 21, the beam profile deformation unit is configured as anoptical element including a concave mirror plane having a curvedsurface, and configured to meet the formula: 2.2/(m/2)<r/d<17.9/(m/2)where m indicates the number of modulation steps of the light-pathmodulation unit, d is a diameter of the concave mirror plane having thecurved surface, and r is an average radius of curvature of the concavemirror plane.

[0485] Moreover, in the embodiment 21, the embedding layer having theindex of refraction of 1.6 or more is taken into consideration. The beamprofile deformation unit in this embodiment is configured as an opticalelement including a concave mirror plane having a curved surface, andconfigured to meet the formula: 1.1/(m/2)<n×Fr<8.91(m/2) where Frindicates an F value of the concave mirror plane, m indicates the numberof modulation steps of the light-path modulation unit, and n is an indexof refraction of the embedding layer of the beam profile deformationunit.

[0486] Furthermore, in the embodiment 21, the Fi value being 4 isconsidered. The beam profile deformation unit in this embodiment isconfigured as an optical element including a concave mirror plane havinga curved surface, and configured to meet the formula:0.27/(m/2)<n×(Fr/Fi)<2.2/(m/2) where Fr indicates an F value of theconcave mirror plane, Fi indicates an F value of the irradiation beamincident to the optical modulators, m indicates the number of modulationsteps of the light-path modulation unit, and n is an index of refractionof the embedding layer of the beam profile deformation unit.

[0487]FIG. 28 shows the embodiment 22 of the image display apparatus ofthe present invention when the micro lens and the mirror plane areunited.

[0488] In FIG. 28, reference numeral 151 is the back plain having theupper surface reflector, 152 is the micro lens, 153 is the flattenedlayer, 154 is the liquid crystal layer, and 155 is the oppositesubstrate.

[0489] Although illustration has not been carried out, the ITOelectrode, the contact hole, etc. whose liquid crystal layer is includedas in FIG. 18 are formed.

[0490] In this embodiment, the almost same pixel profile as FIG. 18 canbe deformed by the micro lens being united with the reflector, and beingarranged the light source side to the liquid crystal layer at theopposite side.

[0491] Simultaneously, since the mirror can be constituted from the flatsurface, production becomes easier, yield's can improve and can consideras low cost.

[0492] The configuration of the micro lens serves twice simultaneous inthe same part, and the curvature may be small. The production processbecomes easy, and the yield also becomes small.

[0493] Besides embedding and carrying out the flattening of the microlens of the convex configuration with the high index of refraction withthe material of the low index of refraction, it is possible to embed andform the micro lens of the shape of a concave of the low index ofrefraction with the material of the high index of refraction.

[0494]FIG. 29 shows the embodiment 23 of the image display apparatus ofthe present invention when the micro lens and the mirror plane areunited.

[0495] In FIG. 29, reference numeral 151 is the back plain having theupper surface reflector, 161 is the micro lens lower layer, 162 is themicro lens, 153 is the flattened layer, 154 is the liquid crystal layer,and 155 is the opposite substrate.

[0496] Although illustration has not been carried out, the ITOelectrode, the contact hole, etc. whose liquid crystal layer is includedas in FIG. 18 are formed.

[0497] In the embodiment, the micro lens is the same as that of the casewhere the reflector and the micro lens are united like FIG. 28, by beingin the opposite side of the liquid crystal layer as an optical action,although separated by the concave surface configuration material and thelower layer 161.

[0498] In the case, since the number of the fields of the lens can beincreased, the yield of the lens can be reduced more and the imagedisplay of the high resolution can be performed by controlling the pixelprofile more.

[0499] Moreover, by making thickness of the lens thin, the absolutevalue of dispersion in the thickness of the flattened layer in the caseof the polish produced by the stress corresponding to the concavo-convexconfiguration can also be decreased, the gap is more uniform and theimage display apparatus with little dispersion within the field with thehigh contrast can be offered.

[0500]FIG. 30 shows the embodiment 24 of the image display apparatus ofthe present invention when the micro prism and the mirror plane areunited.

[0501] In FIG. 30, reference numeral 151 is the back plain having theupper surface reflector, 171 is the micro prism, 153 is the flattenedlayer, 154 is the liquid crystal layer, and 155 is the oppositesubstrate.

[0502] Although illustration has not been carried out, the ITOelectrode, the contact hole, etc. whose liquid crystal layer is includedas in FIG. 18 are formed.

[0503] In the embodiment, the almost same pixel profile as FIG. 18 canbe deformed by the micro prism being united with the reflector, andbeing arranged the light source side to the liquid crystal layer as inFIG. 28, at the opposite side.

[0504] Simultaneously, since the mirror and the prism can be constitutedfrom the flat surface, production becomes easier, yield's can improveand can consider as low cost.

[0505]FIG. 31 shows the embodiment 25 of the image display apparatus ofthe present invention when the modulation layer and the concave mirrorplane are united.

[0506] In FIG. 31, reference numeral 181 is the back plain having theSRAM, 182 is the hinge pillar, 183 a and 183 b are the concave mirrormovable parts, and 184 a and 184 b are the flattened layers of theconcave mirror.

[0507] In this embodiment, the movable parts 183 a and 183 b are themodulation layers which are produced with the MEMS technique and performthe optical modulation by the deviation control. They are areflection-type element which performs the digital modulation of zeroand one for the reflection light with the two states: the state of theparts 183 a and 184 a and the state of the parts 183 b and 184 b.

[0508] In this embodiment, while the almost same pixel profile as FIG.18 can be deformed by forming the concave mirror configuration in theportion used as the movable mirror, since the pixel reduction in theimpossible deviated type optical modulator is realizable, the highcontrast of the deviated type optical modulator is realizable with theconventional micro-lens opposite substrate.

[0509] The restriction of the pixel pitch which has the limitationaccording to the MEMS configuration can be simultaneously solved byoptical-axis shift, and the image display apparatus of the highresolution can be realized.

[0510] Since the flattened layer can make the focal distance of theconcave mirror small, it is effective for the image display apparatus.

[0511] Besides the concave mirror configuration, it is possible toconstitute the micro lens on the plane mirror.

[0512]FIG. 32 shows the embodiment 26 of the image display apparatus ofthe present invention at the time of using the shading layer for thespatial optical modulator.

[0513] In FIG. 32, reference numeral 151 is the back plain having theupper surface reflector, 152 is the micro lens, 153 is the flattenedlayer, 154 is the liquid crystal layer, 155 is the opposite substrate,and 191 a-191 d are the black matrix layers prepared around the concavemirror in the shape of a lattice.

[0514] Although illustration has not been carried out, the ITOelectrode, the contact hole, etc. whose liquid crystal layer is includedas in FIG. 18 are formed.

[0515] In this embodiment, by masking the large portion of the yield ofthe concave mirror at the same time it can reduce the scattered lightnear the edge of the concave mirror and improves the contrast, the blackmatrix layers 91 a-91 d can reduce the pixel size more, and the imagedisplay apparatus of this embodiment can provide higher resolutionimaging.

[0516] The reflection-type light valve of FIG. 18 is not limited to theabove-described embodiments, and it is applicable to a space type lightexchange switch for optical communications. Alternatively, it isapplicable to an optical-information-processing circuit device bycombining the flat-surface type light-receiving unit, the operationalcircuit, the flat-surface type light emitting element, the micro-lensmulti-stage array, etc.

[0517] The present invention is not limited to the above-describedembodiments, and variations and modifications may be made withoutdeparting from the scope of the present invention.

[0518] Further, the present invention is based on Japanese priorityapplication No. 2002-049840, filed on Feb. 26, 2002, and Japanesepriority application No. 2002-048010, filed on Feb. 25, 2002, the entirecontents of which are hereby incorporated by reference.

What is claimed is
 1. A projection image display apparatus comprising:an indicating element which modulates or emits light as a pixel inaccordance with image information; a displacement unit which opticallydisplaces a position of the pixel for each of two or more sub-fieldsconstituting an image field corresponding to the image information; aprojection unit which enlarges the pixel and projects an enlarged pixelon a screen; and a pixel-profile deformation unit which deforms anoptical intensity profile of the pixel.
 2. The projection image displayapparatus of claim 1 wherein the pixel-profile deformation unit deformsthe optical intensity profile of the pixel into a pixel profile of anon-rectangle configuration.
 3. The projection image display apparatusof claim 2 wherein the pixel of the pixel profile produced by thepixel-profile deformation unit has a concave portion near a center ofthe pixel.
 4. The projection image display apparatus of claim 1 whereinthe pixel-profile deformation unit deforms the optical intensity profileso as to meet the formula: w<=0.7 p×(2/n) where w is a full width athalf maximum of the resulting pixel profile, p is a pixel pitch, and nis an integer above 2 and indicates the number of steps in whichdisplacement is carried out by the displacement unit.
 5. The projectionimage display apparatus of claim 1 wherein the pixel-profile deformationunit deforms the optical intensity profile so as to meet the formula:0.5 p×(2/n)<w<=0.7 p×(2/n) where w is a full width at half maximum ofthe resulting pixel profile, p is a pixel pitch, and n is an integerabove 2 and indicates the number of steps in which displacement iscarried out by the displacement unit.
 6. The projection image displayapparatus of claim 1 wherein the pixel-profile deformation unit deformsthe optical intensity profile so that a minimum optical intensity of acontinuation pixel profile produced from two or more continuous pixelprofiles produced by the pixel-profile deformation unit is less than 43%of a maximum optical intensity of the continuation pixel profile.
 7. Theprojection image display apparatus of claim 1 wherein the pixel-profiledeformation unit deforms the optical intensity profile so as to meet theformula: w<=0.7 p×(2/n) where w is a full width at half maximum of theresulting pixel profile, p is a pixel pitch, and n is an integer above 2and indicates the number of steps in which displacement is carried outby the displacement unit, and wherein the pixel-profile deformation unitdeforms the optical intensity profile so that a minimum opticalintensity of a continuation pixel profile produced from two or morecontinuous pixel profiles produced by the pixel-profile deformation unitis less than 33% of a maximum optical intensity of the continuationpixel profile.
 8. The projection image display apparatus of claim 2wherein the pixel-profile deformation unit deforms the optical intensityprofile so as to meet the formula: w<=0.6 p×(2/n) where w is a fullwidth at half maximum of the resulting pixel profile, p is a pixelpitch, and n is an integer above 2 and indicates the number of steps inwhich displacement is carried out by the displacement unit.
 9. Theprojection image display apparatus of claim 1 wherein the pixel-profiledeformation unit deforms the optical intensity profile so as to meet theformula: W<=0.7P×(2/n) where W is a full width at half maximum of aprojection pixel profile of the enlarged pixel produced for eachsub-field by the projection unit from the pixel of the resulting pixelprofile, P is a pitch of the enlarged pixel, and n is an integer above 2and indicates the number of steps in which displacement is carried outby the displacement unit.
 10. The projection image display apparatus ofclaim 1 wherein the pixel-profile deformation unit deforms the opticalintensity profile so as to meet the formula: 0.5P×(2/n)<W<=0.7P×(2/n)where W is a full width at half maximum of a projection pixel profile ofthe enlarged pixel produced for each sub-field by the projection unitfrom the pixel of the resulting pixel profile, P is a pitch of theenlarged pixel, and n is an integer above 2 and indicates the number ofsteps in which displacement is carried out by the displacement unit. 11.The projection image display apparatus of claim 1 wherein thepixel-profile deformation unit deforms the optical intensity profile sothat a minimum optical intensity of a continuation pixel profile, whichis produced from two or more continuous pixel profiles produced by thepixel-profile deformation unit based on two or more continuous pixelsprojected by the projection unit, is less than 43% of a maximum opticalintensity of the continuation pixel profile.
 12. The projection imagedisplay apparatus of claim 1 wherein the pixel-profile deformation unitdeforms the optical intensity profile so as to meet the formula:W<=0.7P×(2/n) where W is a full width at half maximum of a projectionpixel profile of the enlarged pixel produced for each sub-field by theprojection unit from the pixel of the resulting pixel profile, P is apitch of the enlarged pixel, and n is an integer above 2 and indicatesthe number of steps in which displacement is carried out by thedisplacement unit, and wherein the pixel-profile deformation unitdeforms the optical intensity profile so that a minimum opticalintensity of a continuation pixel profile produced from two or morecontinuous pixel profiles produced by the pixel-profile deformation unitis less than 33% of a maximum optical intensity of the continuationpixel profile.
 13. The projection image display apparatus of claim 1wherein the pixel-profile deformation unit deforms the optical intensityprofile so as to meet the formula: W<=0.7P×(2/n) where W is a full widthat half maximum of a projection pixel profile of the enlarged pixelproduced for each sub-field by the projection unit from the pixel of theresulting pixel profile, P is a pitch of the enlarged pixel, and n is aninteger above 2 and indicates the number of steps in which displacementis carried out by the displacement unit, and wherein the pixel-profiledeformation unit deforms the optical intensity profile of the pixel intoa pixel profile of a non-rectangle configuration, and the pixel of thepixel profile produced by the pixel-profile deformation unit has aconcave portion near a center of the pixel.
 14. The projection imagedisplay apparatus of claim 1 wherein the pixel-profile deformation unitincludes a micro-lens array which is formed with a curved surface. 15.The projection image display apparatus of claim 1 wherein thepixel-profile deformation unit includes a gradient-index lens array inwhich a refractive index is distributed therein.
 16. The projectionimage display apparatus of claim 1 wherein the pixel-profile deformationunit includes a concave surface mirror array having a concave surfacemirror.
 17. The projection image display apparatus of claim 1 whereinthe pixel-profile deformation unit includes an aperture array having anarea smaller than an area of the original pixel.
 18. An image displayapparatus comprising: a light source which emits light; an irradiationoptical element which converts the light from the light source into anirradiation beam; a plurality of optical modulators arranged on a flatsurface, the plurality of optical modulators optically modulating theirradiation beam incident to the optical modulators, and each opticalmodulator reflecting the irradiation beam to output a reflected beam; alight-path modulation unit modulating a light path of the reflected beamfrom the plurality of optical modulators in space coordinates; and areflection-type beam profile deformation unit, provided in each of theplurality of optical modulators, which deforms a beam profile of thereflected beam output from each optical modulator.
 19. The image displayapparatus of claim 18 wherein the beam profile deformation unitcomprises an optical element which includes a mirror plane having aconcave portion.
 20. The image display apparatus of claim 18 wherein thebeam profile deformation unit comprises an optical element whichincludes a concave mirror plane having a curved surface.
 21. The imagedisplay apparatus of claim 19 wherein the beam profile deformation unitincludes an embedding member at each of an incident side and an outgoingside of the mirror plane, and the embedding member being made of atransparent material having an index of refraction that is equal to orlarger than 1.6.
 22. The image display apparatus of claim 18 wherein thebeam profile deformation unit comprises an optical element whichincludes a concave mirror plane having a curved surface, and wherein thebeam profile deformation unit is configured to meet the formula:2.2(m/2)<r/d<17.91(m/2) where m indicates the number of modulation stepsof the light-path modulation unit, d is a diameter of the concave mirrorplane having the curved surface, and r is an average radius of curvatureof the concave mirror plane.
 23. The image display apparatus of claim 18wherein the beam profile deformation unit comprises an optical elementwhich includes a concave mirror plane having a curved surface, andwherein the beam profile deformation unit is configured to meet theformula: 1.1/(m/2)<n×Fr<8.9/(m/2) where Fr indicates an F value of theconcave mirror plane, m indicates the number of modulation steps of thelight-path modulation unit, and n is an index of refraction of anembedding member of the beam profile deformation unit.
 24. The imagedisplay apparatus of claim 18 wherein the beam profile deformation unitcomprises an optical element which includes a concave mirror planehaving a curved surface, and wherein the beam profile deformation unitis configured to meet the formula: 0.27/(m/2)<n×(Fr/Fi)<2.2/(m/2) whereFr indicates an F value of the concave mirror plane, Fi indicates an Fvalue of the irradiation beam incident to the optical modulators, mindicates the number of modulation steps of the light-path modulationunit, and n is an index of refraction of an embedding member of the beamprofile deformation unit.
 25. The image display apparatus of claim 18wherein the beam profile deformation unit comprises an optical elementwhich is formed integrally with both a mirror plane and a micro lens.26. The image display apparatus of claim 25 wherein the micro lenscomprises a curved surface.
 27. The image display apparatus of claim 25wherein the micro lens comprises a gradient-index lens array.
 28. Theimage display apparatus of claim 18 wherein the beam profile deformationunit comprises an optical element which is formed integrally with both amirror plane and a micro prism.
 29. The image display apparatus of 28wherein the micro prism of the beam profile deformation unit includes adiffraction grating.
 30. The image display apparatus of claim 18 whereinthe plurality of optical modulators include an optical-modulation layerwhich modulates light by a permeability change or a deviation anglechange, and the beam profile deformation unit is provided over a surfaceof the optical-modulation layer opposite to the irradiation beam in adirection of incidence.
 31. The image display apparatus of claim 30further comprising a flattened layer provided between the beam profiledeformation unit and the optical-modulation layer.
 32. The image displayapparatus of claim 31 further comprising an electric conduction layerbetween the flattened layer and the optical-modulation layer.
 33. Theimage display apparatus of claim 18 wherein the plurality of opticalmodulators include an optical-modulation layer which modulates light bya permeability change or a deviation angle change, and the beam profiledeformation unit is formed integrally with the optical-modulation layer.34. The image display apparatus of claim 18 wherein the plurality ofoptical modulators include a shading layer having an aperture.
 35. Theimage display apparatus of claim 18 wherein a full width at half maximumof the beam profile of the reflected beam from each optical modulator issmaller than a pitch of the optical modulators, and an imaging lens isprovided to perform imaging of the reflected beam at a locationdifferent from a location of an optical-modulation layer of the opticalmodulators.
 36. The image display apparatus of claim 18 wherein a fullwidth at half maximum of the beam profile of the reflected beam fromeach optical modulator is smaller than a pitch of the opticalmodulators, and a virtual image forming lens is provided to performvirtual imaging of the reflected beam at a location different from alocation of an optical-modulation layer of the optical modulators.